PXRMS'98 - Advance Program

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SUNDAY, MARCH 1

12:00-22:00 Registration

12:30-17:30 TUTORIAL on X-ray Scattering from Multilayers and Thin Films

12:30-14:00 Part I. X-Ray Diffraction and X-Ray Reflectivity Analysis Eric Fullerton

14:00-14:30 Break

14:30-16:00 Part II. Diffuse Scattering: X-Ray and EUV Eberhard Spiller

16:00-16:30 Break

16:30-17:30 Part III. Commercial Software for XRR and Diffuse Scattering Analysis

16:30-17:00 Keith Bowen, Bede Scientific

17:00-17:30 Dick de Boer, Philips Research Laboratories

19:00-22:00 Welcome Reception / Buffet Dinner

MONDAY, MARCH 2

07:00-08:00 Breakfast

08:00-08:15 Opening Remarks

08:15-09:40 1. MAGNETIC AND ELECTRONIC PROPERTIES I

Ivan Schuller, Session chair

08:15 1.1 INVITED Use of polarized X-ray absorption spectroscopy for the study of ferromagnetic and antiferromagnetic multilayers Joachim Stohr, IBM, Almaden Research Center, 650 Harry Road, San Jose, CA 95120

09:00 1.2 Complete magneto-optical description of Fe near its L_2,3 edges J.B. Kortright and Sang-Koog Kim, Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720

09:20 1.3 Neutron scattering from the spin-density-wave magnetism in itinerent antiferromagnetic Cr/Cr-Mn superlattices Eric E. Fullerton, IBM Almaden Research Center, K63/E3, 650 Harry Rd., San Jose, CA 95120, C. H. Sowers and S. D. Bader, Argonne National Laboratory, Argonne, IL 60439, and J. L. Robertson, Oak Ridge National Laboratory, Oak Ridge, TN 37831

09:40-10:10 Break

10:10-11:55 2. MULTILAYER X-RAY OPTICS I

Charlie Falco, Session chair

10:10 2.1 INVITED New x-ray mirrors for hard and soft x-rays Hartmut Zabel Institute für Experimentalphysik/Festkörperphysik Fakultät für Physik und Astronomie Ruhr-Unversität Bochum, D 44780 Bochum, Germany

10:55 2.2 Multilayer supermirror for hard X-ray optics Kazutoshi Haga, Akihiro Furuzawa, Hideyo Kunieda, Gyanendra Lodha, Norio Nakajo, Norihiko Nakamura, Takashi Okajima, Harumi Takata, Keisuke Tamura, Yuzuru Tawara and Koujun Yamashita Department of Physics, Nagoya University Furo-cho, Chikusa, Nagoya, 464 Japan Yoshiharu Namba Department of Mechanical Engineering, Chubu University 1200, Matsumoto-cho, Kasugai, 487 Japan

11:15 2.3 Laterally graded multilayers for X-ray applications Ch. Morawe, P. Pecci, E. Ziegler European Synchrotron Radiation Facility BP 220, 38043 Grenoble cedex, France

11:35 2.4 Depth graded multilayers for hard X-ray telescopes Peter H. Mao, Fiona A. Harrison, Finn Christensen, Ahsen Hussain, D. L. Windt, Y. Platonov

11:55-18:00 Free

18:00-19:30 Dinner

19:30-21:15 3. MULTILAYER X-RAY OPTICS II

Eberhard Spiller, Session chair

19:30 3.1 INVITED Observing the Sun with x-ray multilayers: past, present and future Dr. Leon Golub, Smithsonian Astrophysical Observatory, 60 Garden St. Cambridge, Mass. 02138 golub@corona.harvard.edu

20:15 3.2 Fabrication of multilayer mirrors for the XUV Doppler telescope for solar corona observation Wakana ISHIYAMA¹, Katsuhiko MURAKAMI ¹, Saku TSUNETA², Taro SAKAO ³, Hirohisa HARA ³, Toshifumi SHIMIZU ², Tsuyoshi YOSHIDA ², Shin'ichi NAGATA ² and Ryouhei KANO ², 1: Nikon Corporation, 1-6-3 Nishi-Ohi Shinagawa-ku, Tokyo, 140, Japan; 2: Faculty of Science, The University of Tokyo, Bunkyo-ku, Tokyo, 113, Japan; 3: National Astronomical Observatory, 2-21-1 Osawa, Mitaka, Tokyo, 181, Japan

20:35 3.3 The production of multilayer-coated X-ray mirrors via electroforming M. P. Ulmer, R. Altkorn, and Y.-W. Chung, Nothwestern Unversity, A. Krieger and D. Parsignault Radiation Science, Inc B. Lai and D. C. Mancini, Argonne National Lab, and P. Takacs, Brookhaven National Lab

20:55 3.4 W/Si and W/B₄C multilayers deposited on thin substrates of glass, epoxy replicated aluminum foil, and Si wafer. Yuriy Platonov, David Broadway, and Brian DeGroot Osmic Inc., 1788 Northwood Drive, Troy, MI 48084, USA Tel. 1-248-362-1290, fax 1-248-362-4043, e-mail platonov@osmic.com

TUESDAY, MARCH 3

07:00-08:00 Breakfast

08:00-09:25 4. MULTILAYER X-RAY OPTICS III

David Windt, Session chair

08:00 4.1 Characterization of phase effects due to multilayer coatings in a two-mirror Schwarzschild imaging objective E. Tejnil ^a,b , K. A. Goldberg ^a,c , J. Bokor ^a,b (a) Center for X-ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (b) EECS Department, University of California, Berkeley, CA 94720 (c) Physics Department, University of California, Berkeley, CA 94720

08:20 4.2 INVITED Theory and practice of soft x-ray transmission multilayer polarizers Werner Jark SINCROTRONE TRIESTE, Scientific Division - Multilayer Technology Laboratory S.S. 14 km 163.5 in Area Science Park, 34012 Basovizza - Trieste, Italy

09:05 4.3 Creating an X-ray standing wave with Bragg optics Charles M. Falco Optical Sciences Center and Department of Physics University of Arizona, Tucson Tucson, Arizona 85721-0081

09:25-09:55 Break

09:55-11:00 5. NOVEL CHARACTERIZATION TECHNIQUES I

Sam Bader, Session chair

09:55 5.1 INVITED Opportunities for magnetic materials research at the ALS Neville Smith, ALS, Berkeley, CA

10:40 5.2 Extreme sensitivity of EUV ellipsometry to layered structures Masaki Yamamoto and Minaji Furudate Lab. of Soft-X-Ray Multilayers, Res. Inst. Sci. Meas., Tohoku University 2-1-1 Katahira, Sendai 980-77 Japan Fax +81-22-217-5379, e-mail yamamoto@yamame.rism.tohoku.ac.jp

11:00-12:00 6. STRUCTURE I

Jon Slaughter, Session chair

11:00 6.1 Stress evolution in Mo/a-Si multilayers for high-reflectivity EUV mirrors J.M. Freitag, V. Ramaswamy, B.M. Clemens Dept. of Materials Science and Engineering, Stanford University, Stanford, CA 94305-2205.

11:20 6.2 Stress in molybdenum/silicon and di-molybdenum carbide/silicon multilayer structures Tai D. Nguyen and Troy W. Barbee, Jr. Chemistry and Materials Science Department, Lawrence Livermore National Laboratory, Livermore, CA 94550

11:40 6.3 Morphology and oxidation of U/Al, UN/Al, Al/Si, and B₄C/Si multilayer thin films Adam Fennimore, Carlos Vazquez Lopez*, Ben Chao**, R. Steven Turley, David D. Allred, Brigham Young University, Provo, UT 84602, *Depto. de fisica, CINVESTAV del IPN, Mexico DF, Mexico, ** Energy Conversion Devices,1675 W. Maple Rd., Troy, MI 48084

12:00-18:00 Free

18:00-19:30 Dinner

19:30-20:35 7. MAGNETIC AND ELECTRONIC PROPERTIES II

Eric Fullerton, Session chair

19:30 7.1 INVITED New directions in magnetic films research S. D. Bader Materials Science Division Argonne National Laboratory

20:15 7.2 Electronic superlattice effects Ivan K. Schuller, Sihong Kim, J. Gallego and D. Lederman Physics Department-0319, University of California-San Diego, La Jolla, CA, 92093-0319

20:35-22:30 8. POSTER SESSION I

Eric Fullerton, Session chair

20:35-21:00 Poster Advertisements

21:00-22:30 Posters and Refreshments

8.1 Anomalous dispersion effect on x-ray reflectivity intensities around multilayer Bragg peaks K.-B. Lee ^a;b , D. R.Lee ^a , D. H. Chae ^a , Y. J. Park ^b , and Y. H. Jeong ^a a: Department of Physics, POSTECH, Pohang 790-784, Korea b: Pohang Accelerator Laboratory, POSTECH, Pohang 790-784, Korea

8.2 The oxidation rate of thin films of uranium and uranium nitride as measured by the use of ellipsometry, Shon T. Prisbrey, R. Steven Turley, David D. Allred, Department of Physics and Astronomy, Brigham Young University, Provo, UT

8.3 Effect of substrate on the molecular arrangement in cd-arachidate multilayers - an X-ray study Satish Vitta Department of Metallurgical Engineering and Materials Science Indian Institute of Technology, Bombay Bombay 400 076; India

8.4 X-ray reflection from inorganic and organic multilayers Dick K.G. de Boer and Ann J.G. Leenaers, Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands

8.5 Deposition and X-ray performance of W/B₄C multilayers with d-spacings of 1.1nm - 1.4nm Yuriy Platonov and David Broadway Osmic Inc., 1788 Northwood Drive, Troy, MI 48084, USA Tel. 1-248-362-1290, fax 1-248-362-4043, e-mail platonov@osmic.com

8.6 Study of structure and interfacial roughness of extreme ultraviolet (EUV) multilayered interferential mirrors (MIMs) by computer processing of electron microscope cross-sections of MIMs M.O. FLAISSIER, M. RASIGNI and G. RASIGNI Département de Physique des Interactions Photons-Matière CaseEC1, Faculté des Sciences et Techniques de St Jérôme, 13397 MarseilleCedex 20, France E-mail: M9103038@EDUC-003.U-3MRS.FR

8.7 Will the real optical constants please stand up: Problems in obtaining optical constants for materials in the VUV Matthew B.Squires, R. Steven Turley, David D. Allred, Department of Physics and Astronomy, Brigham Young University, Provo, Ut 84604

8.8 Magnetic reflectivity measurements in Fe/Gd multilayers C. Nelson ^a,b , C. Venkataraman ^a , G. Srajer ^a , J. Lang ^a , H. Hashizume ^c , N. Ishimatsu ^c , O. Sakata ^c , T. Iizuka ^c , N. Hosoito ^d , K. Namikawa ^e , T. Iwazumi ^f , K.B. Lee ^g , D.R. Lee ^g and S. Sinha ^a a Advanced Photon Source, Argonne National Laboratory, Argonne, IL, 60439 b Department of Physics and Astronomy, Northwestern University, Evanston, IL, 60208 c Materials and Structures Laboratory, Tokyo Institute of Technology, Nagatsuta, Midori, Yokohama 226, Japan d Institute of Chemical Research, University of Kyoto, Uji 611, Japan e Tokyo Gakugei University, Koganei 184, Japan f Photon Factory, Institute of Materials Structure Science, Tsukuba 305, Japan, g Pohang Institute of Science and Technology, Pohang 790-784, Korea

WEDNESDAY, MARCH 4

07:00-08:00 Breakfast

08:00-09:25 9. X-RAY OPTICAL CONSTANTS

Steve Vernon, Session chair

08:00 9.1 Measurements of the refractive index of Mo for multilayer mirror applications Regina Soufli ^y;z and Eric M. Gullikson ^y y: Center for X-ray Optics Lawrence Berkeley National Laboratory Berkeley, California 94720 z: Department of Electrical Engineering and Computer Sciences University of California, Berkeley, California 94720 E-mail address: regina@grace.lbl.gov

08:20 9.2 INVITED X-ray interferometry, a new tool for optical constant determination Denis JOYEUX, Institut d'Optique, (URA 14) BP 147, 91403 ORSAY cedex François POLACK, LURE (UMR 130) bat 209d, Campus d'Orsay - 91405 ORSAY cedex

09:05 9.3 Optical constants from AXAF synchrotron reflectance measurements D.E. Graessle, A.J. Burek, J.J. Fitch, R. Soufli, J.B. Sweeney, SAO, R.L. Blake, R&D Services, Prop.

09:25-09:55 Break

09:55-12:00 10. ROUGHNESS, MODELING, AND X-RAY SCATTERING I

Dan Stearns, Session chair

09:55 10.1 INVITED Diffuse x-ray reflectivity of strained superlattices Vaclav Holy, Laboratory of Thin Films and Nanostructures, Masaryk University, Brno, Czech Republic holy@physics.muni.cz

10:40 10.2 Models for diffuse x-ray scattering from multilayer structures Dick K.G. de Boer, Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands

11:00 10.3 Roughness of ultra-short-period W/B₄C multilayers by specular and diffuse X-ray scattering -microstructural limits on reflectivity C. C. Walton and J. B. Kortright Lawrence Berkeley National Laboratory, Berkeley, Calif. USA 94720

11:20 10.4 IMD: Software for modeling the optical properties of multilayers David L. Windt Bell Laboratories, Lucent Technologies, Room 1D-456, 600 Mountain Ave, Murray Hill, NJ 07974 windt@bell-labs.com

11:40 10.5 Determination of multilayer structures from grazing incidence X-ray reflectometry measurements using a simulated annealing algorithm A. Basille, E. Ziegler, C. Ferrero, J.M. Revillard, Ch. Morawe

12:00-18:00 Free

18:00-19:30 Dinner

19:30-20:35 11. ROUGHNESS, MODELING, AND X-RAY SCATTERING II

Eric Ziegler, Session chair

19:30 11.1 INVITED The failure of conventional wisdom: multilayer roughness and reflectivity D. G. Stearns OS Associates, Mountain View, California healthst@ricochet.net and E. M. Gullikson Center for X-ray Optics Lawrence Berkeley National Laboratory Berkeley, California 94720

20:15 11.2 Non-Specular EUV scattering from multilayers at normal incidence E. M. Gullikson Center for X-ray Optics Lawrence Berkeley National Laboratory Berkeley, California 94720 and D. G. Stearns OS Associates, Mountain View, California healthst@ricochet.net

20:35-22:30 12. POSTER SESSION II

Eric Ziegler, Session Chair

20:35-21:00 Poster Advertisements

21:00-22:30 Posters and Refreshments

12.1 Thin film X-ray waveguides: "condenser systems" for submicron resolution x-ray microscopy Silvia Di Fonzo, Gerard Soullie' and Werner Jark SINCROTRONE TRIESTE, S.S. 14 km 163.5, 34012 Basovizza - Trieste, Italy Stefano Lagomarsino and Alessia Cedola (*) IESS - CNR, Via Cineto Romano 42, 00156 Roma, Italy Peter Cloetens (*) EMAT, University of Antwerp (RUCA), 2020 Antwerp, Belgium Christian Riekel ESRF, B.P. 220, 38043 Grenoble, France

12.2 X-ray specular and diffuse scatter characterization of near ideal thin film multilayers on various substrates produced by dual ion beam deposition. Joseph Pedulla, J. Pedulla & Associates, Silver Spring, MD, USA; Scott M. Owens and Richard D. Deslattes, National Institute of Standards and Technology, Gaithersburg, MD, USA.

12.3 Diffuse x-ray reflectivity study of graded interface roughness in Mo/Si multilayers K.-B. Lee ^a;b, D. R.Lee ^a , Y. J. Park ^b , Y. H. Jeong ^a and H. Takenaka ^c a Department of Physics, POSTECH, Pohang 790-784, Korea b Pohang Accelerator Laboratory,POSTECH, Pohang 790-784, Korea c NTT Advanced Technology Corporation, Tokyo 180, Japan

12.4 X-ray reflectivity analysis of GMR materials for magnetoresistive RAM J. Slaughter Motorola, Phoenix Corporate Research Laboratories 2100 East Elliot Road Tempe, Arizona 85284

12.5 Metal/Carbon multilayers deposited by the magnetron and ion - beam sputtering techniques as normal incidence reflectors for wavelengths near the C-K radiation line Yuriy Platonov Osmic Inc., 1788 Northwood Drive, Troy, MI 48084, USA Tel. 1-248-362-1290, fax 1-248-362-4043, e-mail platonov@osmic.com

12.6 Study of interfacial structure of Au/Ni multilayers by diffuse X-ray scattering C. Guichet, S. Labat, O. Thomas, B. Gilles*, A. Marty*, M. Gailhanou** and G. Rasigni*** MATOP, Faculté des Sciences de St Jérôme, 13397 Marseille Cedex 20, France * CEA/DRFMC/SP2M, Centre d'Etudes Nucléaires, 38054 Grenoble Cedex9, France ** LURE, Centre Universitaire Paris-Sud, 91405 Orsay Cedex, France *** LPIPM, Faculté des Sciences de St Jérôme, 13397 Marseille Cedex 20, France

12.7 Surface grating like roughness of Nb/MgO thin films studied by non-specular X-ray reflectivity C. Bouillot*, M. Gailhanou*, S. Lequien**, D. Thiaudière**,S. Andrieu*** and M.Bessière* *LURE, bat 209d, centre universitaire Paris-sud, 91405 ORSAY cedex France ** ESRF, Boîte Postale 220, 38043 GRENOBLE cedex, France *** Laboratoire de Physique des Solides, URA155- CNRS / Universite H. Poincare -Nancy I, bd des Aiguillettes, BP239, 54506 VANDOEUVRE, France

12.8 Ion beam modification of Mo/Si multilayer EUVL optics E. Louis, H.-J. Voorma*, M.J.H. den Hartog, E.L.G. Maas and F. Bijkerk FOM-Institute for Plasma Physics Rijnhuizen, Edisonbaan 14, P.O.Box 1207, 3430 BE Nieuwegein, The Netherlands, Tel +31-(0)30-6096999, Fax: +31-(0)30-6031204, e-mail: louis@rijnh.nl *present address: ASM-Lithography, Veldhoven, The Netherlands

THURSDAY, MARCH 5

07:00-08:00 Breakfast

08:00-09:25 13. MULTILAYER X-RAY OPTICS IV

Masaki Yamamoto, Session chair

08:00 13.1 INVITED Novel multilayer reflectors for "water-window" wavelengths fabricated by atomic layer deposition/epitaxy Hiroshi Kumagai, Masashi Ishii, Sohachi Iwai, Tatzuo Ueki, Yoshinobu Aoyagi, Katsumi Midorikawa and Minoru Obara* The Institute of Physical and Chemical Research, 2-1 Hirosawa, Wako, Saitama, 351-01, Japan. * Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama, 223, Japan.

08:45 13.2 Pathways to high reflectance Mo/Si multilayer coatings for extreme-ultraviolet lithography C. Montcalm et al. Lawrence Livermore National Laboratory, P.O. Box 808, L-395, Livermore, CA 94551

09:05 13.3 Mo/Be multilayers for extreme-ultraviolet lithography S. Bajt, R. D. Behymer, M. Wall, C. Montcalm, S. P. Vernon, F. J. Weber, F. R. Grabner, and J. A. Folta Lawrence Livermore National Laboratory, P. O. Box 808, L-395, Livermore, CA 94550.

09:25-09:55 Break

09:55-11:00 14. NOVEL CHARACTERIZATION TECHNIQUES II

Bruce Clemens, Session chair

09:55 14.1 INVITED Vibrational dynamics of thin films by inelastic nuclear resonant scattering of synchrotron radiation E. E. Alp, Advanced Photon Source, Argonne National Laboratory

10:40 14.2 Study of Si/Mo multilayer reflector structures using picosecond ultrasonics Seongtae Jeong, Dept. of Physics, University of California, Berkeley, CA 94720 Nen-wen Pu, and Jeffrey Bokor, Dept. of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA 94720

11:00-12:00 15. STRUCTURE II

Jeff Kortright, Session chair

11:00 15.1 Pulsed laser deposition of Ni/C- multilayers used for hard and soft X-ray optics R.Dietsch, Th.Holz, H.Mai, C.-F.Meyer Fraunhofer Institute Material and Beam Technology Winterbergstrasse 28, D-01277 Dresden, Germany, Tel: +49 (0) 351/2583-249, Fax. +49 (0) 351/2583-300, e-mail: dietsch@iws.fhg.de R.Scholz Max-Planck-Institute for Microstructure Physics Halle, Weinberg 02, D- 06120 Halle / Saale, Germany, Tel.: +49 (0) 345/5582-626, Fax: +49 (0) 345/5511223, e-mail: roscholz@mpi-halle.mpg.de

11:20 15.2 The application of energetic ions to modify the composition of multilayer components. J. Verhoeven, M. Cilia and R. Schlatmann. FOM Institute for Atomic and Molecular Physics, Kruislaan 407, 1098SJ Amsterdam, The Netherlands.

11:40 15.3 Structure and the stability of 2.4 nm period amorphous Ni-Nb/C multilayers Satish Vitta Department of Metallurgical Engineering and Materials Science, Indian Institute of Technology, Bombay, Bombay 400 076; India.

12:00-12:10 Closing Remarks

Please direct all inquiries to the conference email address: pxrms@physics.div111.bell-labs.com

Last Updated: 6-Feb-98

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