The 7th International Conference
March 7-11, 2004
Rusutsu Resort, Sapporo, Japan
X-ray multilayer structures are now indispensable elements used for the construction of short-wavelength optical instruments operating in the EUV, soft X-ray and hard X-ray range, with important technological and scientific applications ranging from photolithography, X-ray microscopy, astronomy and solar physics, plasma physics, synchrotron radiation, X-ray and free-electron lasers, and others. Continued progress in the development of new and improved multilayers requires deeper understanding of the X-ray optical physics, as well as the material science of these nanometer-scale heterostructures. Papers are solicited on any topic related to the development, understanding or use of X-ray multilayers.
This 7th meeting continues our tradition of holding the biyearly PXRMS conference in a relatively isolated winter resort environment, this year in Hokkaido, Japan's northern-most island. We choose locations such as this for researchers to present their recent results, in order to provide an informal setting that promotes the free exchange of new ideas. Our hope is that these interactions will lead to better understanding and control of film growth, interface formation, microstructure development, performance, and characterization techniques in general, and on optical properties and new applications of planar, free standing, and figured X-ray multilayer optics in particular.