on the
Physics of X-Ray Multilayer Structures
19:00-22:00 Welcome Reception / Buffet Dinner
8:00-8:10 Opening Remarks8:10-9:30 Session 1
8:10-8:50 1.1 INVITED Multilayer optics for spectral range lambda= 0.01 - 30 nm: technology fabrication and application N.N. Salashchenko, Institute for Physics of Microstructures, RAS, GSP-105 Nizhny Novgorod, 603600 Russia9:30-10:00 Break8:50-9:10 1.2 High near-normal reflectivity in the water window of Cr/Sc multilayer X-ray mirrors Fredrik Eriksson*,a , Eric M. Gullikson b Göran A. Johansson c , Hans M. Hertz c , Jens Birch a a: Thin Film Physics Division, IFM, Linköping University, SE-581 83 Linköping, Sweden b: LBNL 2-400, 1 Cyclotron Rd., Berkeley, CA 94720, United States of America c: Biomedical and X-Ray Physics, Royal Institute of Technology/SCFAB, SE-106 91 Stockholm, Sweden
9:10-9:30 1.3 Multilayers based on light material for optics in the 30 nm wavelength region Marie-Françoise RAVET, Françoise BRIDOU, Frank DELMOTTE, Arnaud JEROME Groupe de Physique des Films Minces, Laboratoire Charles Fabry de l'Institut d'Optique, CNRS UMR 8501, Centre Scientifique Bâtiment 503 , BP 147, 91403 Orsay, Cedex FRANCE. Jean-Pierre DELABOUDINIERE, Xueyan SONG, Marie BOUGNET Institut d'Astrophysique Spatiale, Université Paris-Sud Bâtiment 121, 91405 ORSAY Cedex, FRANCE
10:00-12:00 Session 2
10:00-10:40 2.1 INVITED Multilayer normal-incidence gratings with Sc/Si, MoRu/Be, and Mo/Y coatings operating at 40 nm, 11 nm, and 9 nm wavelengths: experimental efficiencies and computational modeling John F. Seely, Space Science Division, Code 7674, Naval Research Laboratory, Washington DC 20375,Leonid I. Goray, International Intellectual Group Inc., P.O. Box 335, Penfield, NY 14526, Alexander Vinogradov and Yu. A. Uspenskii, Lebedev Physical Institute, X-Ray Optics Group, Moscow, Russia, Yu. P. Pershin and V. V. Kondratenko, Kharkov State Polytechnic University, Ukraine, Benjawan Sae-Lao, Sasa Bajt and Sherry Baker, Information Science & Technology, Lawrence Livermore National Laboratory, P.O. Box 808, L-395, Livermore, California 94551, Claude Montcalm, Veeco-Ion Tech, 2330 East Prospect, Fort Collins, CO 8052512:00-18:30 Free10:40-11:00 2.2 Reflectivity and stability of Cr/Sc multilayers for the soft X-ray range Sergiy Yulin, Thomas Kuhlmann, Torsten Feigl, Norbert Kaiser, Fraunhofer-Institut fur Angewandte Optik und Feinmechanik, Schillerstrasse 1, D - 07745 Jena, Germany
11:00-11:20 2.3 New method for the determination of EUV optical constants in chemically active materials: Application to Sc and Ti. Yu.A. Uspenskii a , J.F. Seely b , N.L. Popov a , A.V. Vinogradov a , Yu.P. Pershin c , and V.V. Kondratenko c a: Lebedev Physical Institute, Leninski pr. 53, 119991 Moscow, Russia b: Naval Research Laboratory, Washingthon DC 20375, USA c: Kharkov State Polytechnic University, Frunze str., Kharkiv 310002, Ukraine
11:20-12:00 2.4 INVITED New multilayer concepts for the extreme ultraviolet Juan I. Larruquert, José A. Aznárez, José A. Méndez Instituto de Física Aplicada-CSIC, Madrid, Spain
18:30-20:00 Dinner
20:00-22:00 POSTER SESSION I
P1.1 Production and performance of multilayer coated conic sections M. P. Ulmer a R. I. Altkorn a M. E. Graha b A. Madan b and Y. S. Chu c a: Dept. of Physics & Astronomy, Northwestern University 2131 Sheridan Rd, Evanston, IL 60208-2900, USA b: Advanced Coating Technology Group, Northwestern University 1801 Maple Ave, Evanston, IL 60208-3140, USA c: Advanced Photon Source, Argonne National Lab, 9700 S. Cass Avenue, Argonne, IL 60439, USAP1.2 Defect propagation within multilayer structures: experimental results and optical modeling L. Wang, Y. Ma, T. Gene and F. Cerrina, Center for Nanotechnology Department of Electrical and Computer Engineering University of Wisconsin-Madison
P1.3 Influence of substrate bias voltages on the structure of Mo/Si multilayers E.N. Zubarev, V.V. Kondratenko, V.A. Sevryukova, A.V. Zhurba, S.P. Rubets National Technical University, Kharkov, Ukraine
S. Yulin, T. Feigle, T. Kuhlmann, N. Kaiser Fraunhofer Institute Angewandte Optik und Feinmechanik, Jena, GermanyP1.4 Parametric Radiation emitted from a periodic multilayer target : an efficient tunable x-ray source B. Pardo, Laboratoire Charles Fabry de l'Institut d'Optique, Université Paris-Sud, France. J.-M. André, Laboratoire de Chimie Physique Matière et Rayonnement, UMR 7614 CNRS, Université Paris VI, France.
P1.5 Features of the metal surface treatment with ion beam during fabrication of Ni/C X-ray multilayers
V.V. Kondratenko, Yu. P. Pershyn, Ye. N. Zubarev, National Technical University in Kharkov Polytechnic Institutelc, Frunze street 21, Kharkov, 61002, Ukraine, J. Verhoeven, FOM AMOLF, Kruislaan 407, 1098SJ, Amsterdam, The NetherlandsP1.6 A high NA compact debris stopper for use with a LPP source of multilayer imaging optics Kentaro Sekiyama, Tsuyoshi Kanda, Tadashi Hatano, Minaji Furudate and Masaki Yamamoto, Research Center for Soft X-ray microscopy, Inst. of Multidisciplinary Res. for Adv. Mat., Tohoku Univ., Japan
P1.7 New multilayer mirrors for soft X-rays C. Michaelsen and J. Wiesmann, Institute of Materials Research,GKSS Research Center,21502 Geesthacht,Germany, C. Nowak and B. Steeg, HASYLAB,DESY,22603 Hamburg,Germany, S. Hollensteiner,C. Dieker,and W. Jäger, University of Kiel,Center for Microanalysis,Faculty of Engineering,24143 Kiel,Germany
P1.8 X-ray and AFM study of the roughness of W and B4C films, and of W/B4C multilayer mirrors Igor V. Kozhevnikov a , Victor E. Asadchikov b , Inna N. Bukreeva a , Angela Duparré c ,Yury S. Krivonosov b , Till H.Metzger d , Christian Morawe d , Mikhail V. Pyatakhin a , Jörg Steinert c , and Eric Ziegler d a: Lebedev Physical Institute, Leninsky prospect 53, Moscow 119991, Russia b: Institute of Crystallography, Leninsky prospect 59, Moscow 117333, Russia c: Fraunhofer Institute for Applied Optics and Precision Engineering, Schillerstrasse 1, D-07745, Jena, Germany d: European Synchrotron Radiation Facility, BP 220, 38043 Grenoble Cedex, France
P1.9 In situ analysis of stress relaxation and interface mixing during the growth of metallic epitaxial films and multilayers T. Bigault, European Synchrotron Radiation Facility, BP 220, 38043 Grenoble, France, F. Bocquet, S. Labat, O. Thomas, TECSEN, Faculté des Scinces et Techniques de Saint Jérôme, 13397 Marseille Cedex 20, France, B. Gilles, LTPCM, ENSEEG, BP75, 38402 Saint-Martin d'Hères, France, A.Marty DRFMC / SP2M / NM CEA-Grenoble, 17 rue des Martyrs, 38054 Grenoble, France
P1.10 Normal incidence La/B4C multilayers for wavelengths around B-K radiation line Yuriy Platonov, Osmic, Inc., 1788 Northwood Drive, Troy, MI 48084, USA
P1.11 Single Crystal CrN/ScN (001) as X-Ray Superlattice Mirrors for the Water Window J. Birch, a F. Eriksson, a T. Joelsson, a G. A. Johansson, b L. Hultman, a and H. M. Hertz, b a: Department of Physics and Measurement Technology, Linköping University, SE-581 83 Linköping, Sweden. b: Biomedical and X-ray Physics, The Royal Institute of Tehnology, SE-100 44 Stockholm Sweden
P1.12 Thermal Studies on Mo/Si Multilayer by TEM A.K.Srivastava, P.Tripathi, G.S.Lodha, M.Nayak, R.V.Nandedkar, Centre for Advanced Technology, Indore, 452013, India
P1.13 Multi-layer mirrors (MIM's) diagnosis for XUV source calibration G. Soullie, C. Lafon, R. Rosch, S. Huelvan, R. Marmoret, CEA DIF / DCRE / SDE Centre d'etudes de Bruyeres le Chatel, BP 12, 91680, Bruyeres le Chatel, France
P1.14 Design and fabrication of aperiodic multilayers for near grazing incidence X-UV optics at 3.4 keV F. Bridou, R. Mercier, A. Raynal, P. Fournet, Laboratoire Charles Fabry de l'Institut d'Optique, CNRS UMR 8501, Centre Scientifique Batiment 503, BP 147, 91403 Orsay, France. M. Idir, Groupe Optique,Laboratoire de Spectroscopie Atomique et Ionique,Bat 209 D, Centre Universitaire Paris Sud, BP 34, 91898 Orsay Cedex, France. G. Soullié, P. Troussel, CEA-DAM/DRIF/DCRE/SDE, BP 12, 91680, Bruyères-le-Châtel, France.
P1.15 Diffraction-limited astronomical X-ray imaging using multilayer optics D. L. Windt, Columbia Astrophysics Laboratory, 550 West 120 th Street, New York, NY 10027, G. E. Sommargren, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94550
P1.16 Programmable deposition shutter for multilayer thickness control of ion beam sputtering Tadashi Hatano, Shogo Kubota and Masaki Yamamoto, Research Center for Soft X-ray Microscopy, IMRAM, Tohoku University 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
P1.17 Multilayer optics by Ni electroforming replication: surface characterization of mirror and mandrel prototypes G. Pareschi 1 , O. Citterio and F. Mazzoleni, Osservatorio Astronomico di Brera - Via Bianchi 46 ? 23807 Merate (Lc) ? Italy
P1.18 Interface correlation in short-period multilayers prepaired by various deposition techniques Y. Chushkin, M. Jergel, S. Luby, E. Majkova, Institute of Physics, Slovak Academy of Sciences, 842 28 Bratislava, Slovakia, M. Yamamoto, Research Center for soft X-ray microscopy, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University 2-1-1 Katahira, Sendai 980-8577, Japan, V. Holy, Faculty of Sciences, Masaryk University, 611 37 Brno, Czech Republic
P1.19 Application of Pt/C supermirror to hard X-ray telescope Y. Ogasaka, K. Tamura, H. Satake, K. Yamashita, H. Kito, T. Okajima, Y. Tawara, K. Haga, S. Ichimaru, S. Takahashi, S. Fukuda, A. Goto, S. Kato, K. Nomoto, Department of Physics, Nagoya University, H. Kunieda, The Institute of Space and Astronautical Science, P. Serlemitsos, S. Owens, Y. Soong, K.-W. Chan, F. Berendse, and J. Tueller, Laboratory for High Energy Astrophysics, NASA Goddard Space Flight Center
P1.20 Design and fabrication of broadband and narrowband Mo/Si multilayer mirrors T. Feigl, T. Kuhlmann, S. Yulin, N. Kaiser, Fraunhofer-Institut für Angewandte Optik und Feinmechanik, Schillerstrasse 1, D - 07745 Jena, Germany
P1.21 Reflectivity and morphology of Mo/Si multilayers with B4C and C barrier layers St. Braun 1 , H. Mai 1 , M. Moss 1 , R. Scholz 2 , A. Leson 1 1 Fraunhofer Institut Werkstoff- und Strahltechnik, Winterbergstr. 28, D-01277 Dresden, Germany 2 Max-Planck-Institut für Mikrostrukturphysik Halle, Weinberg 2, D-06120 Halle/Saale, Germany
P1.22 ESRF Multilayer Facility: The Movie Jean-Christophe Peffen, Christian Morawe, Eric Ziegler, European Synchrotron Radiation Facility, BP 220, F-38043, Grenoble Cedex, France
8:10-9:30 Session 38:10-8:50 3.1 INVITED High resolution & reflectivity X-ray and soft X-ray multilayers Troy W. Barbee, Jr Lawrence Livermore National Laboratory, Livermore, CA 94550 USA9:30-10:0 Break8:50-9:10 3.2 High resolution multilayer x-ray optics Christian Morawe, Jean-Christophe Peffen, Eric Ziegler, Andreas K. Freund, European Synchrotron Radiation Facility BP 220, F-38043, Grenoble Cedex, France
9:10-9:30 3.3 Ion Beam Figuring of X-Ray Optics and Optical Surfaces M. Ghigo - O. Citterio, Osservatorio Astronomico di Brera-Milano Via E. Bianchi, 46 - 23807 Merate (Lc), Italy
10:00-12:00 Session 4
10:00-10:40 4.1 INVITED The low energy ion assisted control of interfacial structure: ion incident angle effects Haydn N. G. Wadley, University of Virginia, Department of Materials Science and Engineering, Charlottesville, Virginia 22903-2242, USA12:00-18:00 Free10:40-11:00 4.2 Calibration of the wavefront phase change produced by ion erosion of a reflecting multilayer, by at-wavelength interferometry Denis JOYEUX and Daniel PHALIPPOU, Laboratoire Charles Fabry, Institut d'Optique, BP 147 - 91403 Orsay cedex, FRANCE, Joseph BRAAT and Mandeep SINGH, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands, Udo DINGER and Stefan BURKART, Carl Zeiss, Carl-Zeiss-Strasse, 73446 Oberkochen, GERMANY
11:00-11:20 4.3 Bufferlayer engineering for Mo/Si EUVL multilayer mirrors Th. Westerwalbesloh, O. Wehmeyer, Y. Lim, W. Hachmann, U. Kleineberg, U. Heinzmann (University of Bielefeld, Faculty of Physics, D-33615 Bielefeld, Germany), S. Müllender (Fa. C. Zeiss, D-73446 Oberkochen, Germany)
11:20-12:00 4.4 INVITED High reflectance interface-engineered multilayers Sasa Bajt, Lawrence Livermore National Laboratory, 7000 East Avenue, L-395, Livermore, CA 94550, USA
18:00-22:00 Banquet
8:10-8:50 5.1 INVITED Lateral and vertical ordering of self-assembled semiconductor quantum dots in multilayers studied by grazing incidence x-ray methods T.H. Metzger, European Synchrotron Radiation Facility, ESRF, F-38042, Grenoble, Cedex 99:30-10:0 Break8:50-9:10 5.2 A novel approach to the inverse problem of x-ray reflectometry Igor V.Kozhevnikov a , Victor E.Asadchikov b , Christian Morawe c , Nikolai A.Zhura a , and Eric Ziegler c a: Lebedev Physical Institute, Leninsky prospect 53, Moscow 119991, Russia b: Institute of Crystallography, Leninsky prospect 59, Moscow 117333, Russia c: European Synchrotron Radiation Facility, BP 220, 38043 Grenoble Cedex, France
9:10-9:30 5.3 Extraction of the interface morphology of Mo/Si MLs from the off-specular diffuse X-ray scattering using soft X-rays J. Trenkler 1 , E. Louis 2 , A. Yakshin 2 , F. Scholze 3 , J. Tümmler 3 , F. Eisert 1 , S. Müllender 1 1: Carl Zeiss Semiconductor Manufacturing Technologies AG, 73446 Oberkochen, Germany 2: FOM Rijnhuizen, 3430 BE Nieuwegein, The Netherlands 3: Physikalisch-Technische Bundesanstalt (PTB), 10587 Berlin, Germany
10:00-12:00 Session 6
10:00-10:40 6.1 INVITED In-situ magnetoresistance measurements as a real-time probe of GMR spin valve deposition William Bailey, Materials Science and Engineering Program, Department of Applied Physics, Columbia University12:00-18:30 Free10:40-11:00 6.2 Hard X-ray reflectivity and scattering study of supersmooth surfaces and thin films in Moscow X-Ray Optics Group. V.E.Asadchikov, Yu.S.Krivonosov, Crystallography Institute, Moscow, Russia, I.V.Kozhevnikov, I.V.Pirshin, N.L.Popov, S.I.Sagitov, A.G.Tourjanski, Yu.A.Uspenski, A.V.Vinogradov, Lebedev Physical Institute, Moscow, Russia
11:00-11:20 6.3 Multilayer structure determination from multiple wavelength x-ray reflectivity measurements using a simulated annealing fitting procedure Eric Ziegler, François Lamy, Thierry Bigault, Christian Morawe, Claudio Ferrero, European Synchrotron Radiation Facility, BP 220, 38043 Grenoble Cedex, France
11:20-12:00 6.4 INVITED Variable energy X-ray reflectivity and reflection absorption fine structure B.K. Tanner, T.P.A. Hase, B.D. Fulthorpe, G.M. Luo*, Z.H. Mai*, C.H. Marrows + and B.J. Hickey + University of Durham, Department of Physics, South Road, Durham, DH1 3LE, U.K. *Institute of Physics, Chinese Academy of Sciences, Beijing, 100080, P.R.China + University of Leeds, Department of Physics, Leeds, LS2 9JT, U.K.
18:30-20:00 Dinner
20:00-22:00 POSTER SESSION II
P2.1 Intensity variation of x-ray lines emitted in the Bragg direction from a multilayer irradiated by an electron beam P. Jonnard, J.-M. André, C. Bonnelle, Laboratoire de Chimie Physique Matière et Rayonnement, UMR-CNRS 7614, Université Paris VI, Paris, France, B. Pardo, Laboratoire Charles Fabry de l'Institut d'Optique, Université Paris-Sud, Orsay, FranceP2.2 Characterization of La-based multilayer mirrors for soft x-rays J. Wiesmann, C. Michaelsen, and R. Bormann, Institute of Materials Research, GKSS Research Center, Geesthacht, Germany, S. Hollensteiner, C. Dieker, and W. Jaeger, University of Kiel, Center for Microanalysis, Faculty of Engineering, 24143 Kiel, Germany
P2.3 Ultra-short period alloy/ceramic oxide (Ni80Nb20 / MgO) multilayers for the water window soft x-rays Satish Vitta, Department of Metallurgical Engineering and Materials Science, Indian Institute of Technology, Bombay Mumbai 400 076; India; M. Weisheit and H.-U. Krebs, Institut fur Materialphysik, Universitat Goettingen 37073 Goettingen; Germany
P2.4 Multilayer coating facility for the HEFT hard X-ray telescope Carsten P. Jensen a , Finn E. Christensen a , Eric Ziegler b a: Danish Space Research Institute (Denmark); b: European Synchrotron Radiation Facility (France)
P2.5 Subpicosecond KrF laser micropatterining of soft X-ray Mo/Si multilayers E. Majkova, S. Luby, R. Senderak, Y. Chushkin, M. Jergel, Institute of Physics, Slovak Academy of Sciences, 842 28 Bratislava, Slovakia, I. Zergiotti, D. Papazoglou, A. Manousaki, C. Fotakis, Institute of Electronic Structure and Laser, Foundation for Research and Technology - Hellas, P.O.Box 1527, 71110 Heraklion, Greece
P2.6 Multilayer optics for Total X-Ray Fluorescence (TXRF) spectrometry with W-anode X-ray tube Yuriy Platonov 1 , Takashi Yamada 2 , Luis Gomez 1 , Makoto Doui 2 , David Broadway 1 and Boris Verman 1 1 - Osmic, Inc., 1788 Northwood Drive, Troy, MI 48084, USA, 2 - X-Ray Research Laboratory, Rigaku Corporation, 14-8 Akaoji, Takatsuki, Osaka 569-1146, Japan
P2.7 Optical properties of sliced multilayer gratings. R. M. Fechtchenko a , A.V. Vinogradov, P. N. Lebedev Physical Institute, 53 Leninsky Prospekt, Moscow 117924, Russia
P2.8 X-ray study of slightly rough surfaces and interfaces. V.E.Asadchikov a and I.V.Kozhevnikov b a: Institute of Crystallography, Leninsky prospect 59, Moscow 117333, Russia, b: Lebedev Physical Institute, Leninsky prospect 53, Moscow 119991, Russia
P2.9 Mo/Si multilayer coating technology for EUVL masks H. Hoko, H. Yamanashi, T. Yoneda, E. Hoshino, B. T. Lee, T. Ogawa, and S. Okazaki, EUV Lithography Laboratory, Association of Super-Advanced Electronics Technologies (ASET); c/o NTT Telecommunications Energy Laboratories, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
P2.10 Development of Co x Cr 1-x for using X-ray photoemission spectroscopy in the wavelength region around 6 nm H. Takenaka 1 , K. Nagai 1 , H. Ito 1 , S. Ichimaru 1 , Y. Muramatsu 2 , E. Gullikson 3 1: NTT Advanced Technology Co., 162 Shirakata, Tokai, Ibaraki, 319-1193, Japan, 2: Japan Atomic Energy Research Institue, Sayo-gun, Hyogo 679-5148, Japan, 3: Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
P2.11 Precision soft x-ray/extreme ultra violet reflectometry beamline on Indus-1. G.S.Lodha, K.J.S.Sawhney, A.K.Sinha, M.H.Modi and R.V. Nandedkar, Center for Advanced Technology, Indore, 452013, India
P2.12 Growth of W/Si and WRe/Si multilayers by e-beam deposition using ion assistance. M.J.H. Kessels 1,2 , J. Verhoeven 2 , F.D. Tichelaar 3 , F. Bijkerk 1 1. FOM institute for Plasma Physics Rijnhuizen, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands, 2. FOM institute for Atomic and Molecular Physics [AMOLF], Kruislaan 407, 1098 SJ, Amsterdam, The Netherlands 3. National Centre for HREM, Rotterdamseweg 137, 2628 AL, Delft, The Netherlands
P2.13 Short-period Ni/V multilayer X-ray mirrors for emission-line in the water window Fredrik Eriksson*,a, Sanyalak Niratisairak a, Göran A. Johansson b, Hans M. Hertz b, Jens Birch a a: Thin Film Physics Division, IFM, Linköping University, SE-581 83 Linköping, Sweden b: Biomedical and X-Ray Physics, Royal Inst. of Technology/SCFAB, SE-106 91 Stockholm, Sweden
P2.14 Improved multilayer monochromator for the soft-x-ray domain Rabah BENBALAGH, Robert BARCHEWITZ, Jean-Michel ANDRE, Laboratoire de Chimie Physique - Matière et Rayonnement, Université Pierre et Marie Curie, CNRS UMR 7416, 11 rue Pierre et Marie Curie, 75231 Paris Cedex 05, FRANCE. Marie-Françoise RAVET, Frank DELMOTTE, Françoise BRIDOU Groupe de Physique des Films Minces, Laboratoire Charles Fabry de l'Institut d'Optique, CNRS UMR 8501, Centre Scientifique Bâtiment 503 , BP 147, 91403 Orsay, FRANCE. Gwénäelle JULIE, Alain BOSSEBOEUF, René LAVAL Institut d'Electronique Fondamentale, CEETAM, CNRS UMR 8622, Université Paris Sud, Bâtiment 220, 91405 Orsay, FRANCE. Christian REMOND, Gérard SOULLIE, P. TROUSSEL CEA-DAM/ DRIF/ DCRE/SDE, BP 12, 91680, Bruyères-le-Châtel, FRANCE. Michel FIALIN Centre de Microanalyse CAMPARIS, Université Pierre et Marie Curie, CNRS ESA 7058, 75005 Paris, FRANCE.
P2.15 Experimental study of X-UV beamsplitters for Michelson interferometry. Frank DELMOTTE*, Marie-Françoise RAVET, Françoise BRIDOU, Arnaud JEROME Groupe de Physique des Films Minces, Laboratoire Charles Fabry de l'Institut d'Optique, CNRS UMR 8501, Centre Scientifique Bâtiment 503 , BP 147, 91403 Orsay, FRANCE. Sébastien HUBERT, Philippe ZEITOUN, Mourad IDIR Laboratoire de Spectroscopie Atomique et Ionique, LOA-ENSTA, Chemin de la Huniere F-91761 Palaiseau cedex , FRANCE. Gérard SOULLIE, Philippe TROUSSEL CEA-DAM/ DRIF/ DCRE/SDE, BP 12, 91680, Bruyères-le-Châtel, FRANCE. Pascal AUBERT Université EVRY Val d'Essonne, Laboratoire d'étude des Milieux Nanometriques, Bat. des SciencesBoulevard François Mitterand, 91025 EVRY cedex, FRANCE.
P2.16 A photometric imaging solar telescope, tunable in the soft X-ray band, utilizing multilayer X-ray optics L. Golub, E. Deluca, P. Hamilton, and G. Nystrom, Smithsonian Astrophysical Observatory, 60 Garden Street, Cambridge, MA 02138, D. L. Windt, Columbia Astrophysics Laboratory, 550 West 120 th Street, New York, NY 10027, W. K. H. Schmidt and A. Dannenberg, Max-Planck-Institut für Aeronomie, Max-Planck-Str. 2, 37191 Katlenburg-Lindau, Germany
P2.17 Protection of Mo/Si multilayers with a carbon capping layer A.E. Yakshin, E. Louis, E.L.G. Maas, and F. Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen, Edisonbaan 14, P.O.Box 1207, 3430 BE Nieuwegein, The Netherlands, R. Klein, F. Scholze, Physikalisch-Technische Bundesanstalt, Abbestraße 2-12, 10587 Berlin, Germany, P. Zalm, Philips CFT Center for Industrial Technology, Materials Analysis Dept. Bldg. WY, Rm. 462 Prof. Holstlaan 4, 5656 AA The Netherlands, F. Stietz, M. Wedowski, and S. Müllender, Carl Zeiss, 73446 Oberkochen, Germany B. Mertens TNO TPD, PO Box 155, Delft, The Netherlands, H. Meiling, ASML, Veldhoven, The Netherlands
P2.18 Multilayer optics in advanced instrumentation for fusion plasma diagnostics L.A. Shmaenok, Phystex, Nieuwegein, The Netherlands A.F. Ioffe Institute, St.-Petersburg, Russia
P2.19 Depth-graded multilayers Christian Morawe, Eric Ziegler, Jean-Christophe Peffen, Igor V. Kozhevnikov, European Synchrotron Radiation Facility BP 220, F-38043, Grenoble Cedex, France
P2.20 X-ray nonspecular scattering from amorphous W/C Fibonacci multilayers X. Jiang 1,2* , T. H. Metzger 1 , and D. Xian 2 1. European Synchrotron Radiation Facility, BP 220, 38043 Grenoble, France 2. Beijing Synchrotron Radiation Facility, P.O.Box 918, 100039 Beijing, China
P2.21 Comparative study of the micro-roughness on several optical surfaces to be used as substrate for multilayer coating Luca Peverini, ESRF, BP 220, F-38043, Grenoble Cedex, France
8:10-8:50 7.1 INVITED Compact and tunable X-ray source using electron LINAC and multilayer target with submicrometer period Koji Yamada, NTT Telecommunications Energy Laboratories9:30-10:0 Break8:50-9:10 7.2 Multilayer polarizers for a He discharge and tunable multilayer polarizer for synchrotron radiation Tadashi Hatano, Yuzi Kondo, Katsuhiko Saito, Takeo Ejima, Makoto Watanabe and Masahiko Takahashi, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
9:10-9:30 7.3 Structural and phase transformations in multilayers at thermal and radiation loads E.N. Zubarev, National Technical University, Kharkov, Ukraine
10:00-12:00 Session 8
10:00-10:40 8.1 INVITED Progress of the Extreme Ultraviolet Lithography tool Hiroo Kinoshita, Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology, 3-1-2 Kouto, Kamigori Ako-gun, Hyogo 678-1205, Japan.10:40-11:00 8.2 Atomic-precision multilayer coatings for next-generation lithography systems Regina Soufli, Eberhard Spiller, Mark Schmidt, Lawrence Livermore National Laboratory, Livermore, CA 94550
11:00-11:20 8.3 Micro-crystallites in Mo/Si EUV coatings E. Louis, I.J.W. Wever, A.E. Yakshin, and F. Bijkerk, FOM-Institute for Plasma Physics, Rijnhuizen, Edisonbaan 14, P.O.Box 1207, 3430 BE Nieuwegein, The Netherlands, J. Verhoeven, FOM-Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands, T. Bigault and E. Ziegler, European Synchrotron Radiation Facility P.O. Box 220, 38043, Grenoble, France, J. Trenkler, and S. Müllender, Carl Zeiss, P.O. Box 1380, D- 73446 Oberkochen, Germany
11:20-12:00 8.4 INVITED Smooth multilayer coatings on rough substrates E. Spiller, S. Baker, J. Folta, F. Grabner, P. Mirkarimi, S. Ratti, M. Schmidt, V. Sperry, and D. Stearns, Lawrence Livermore National Laboratory, Livermore, CA. 94550