ADVANCE PROGRAM

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PROGRAM OVERVIEW

SUNDAY, MARCH 5

12:00-22:00 Registration

12:30-16:30 TUTORIAL on X-Ray and Neutron Scattering from Multilayers and Thin Films

12:30-13:30 Part I. Specular and Non-Specular X-Ray Scattering

13:30-14:00 Break

14:00-15:00 Part II. Soft X-Ray Reflectance and Diffuse Scattering

15:00-15:30 Break

15:30-16:30 Part III. Neutron Scattering

19:00-22:00 Welcome Reception / Buffet Dinner

MONDAY, MARCH 6

08:00-08:10 Opening Remarks

08:10-09:10 1. NOVEL APPLICATIONS I

09:10-10:10 2. MAGNETIC THIN FILMS AND X-RAY SCATTERING I

10:10-10:40 Break

10:10-12:00 3. GROWTH AND STRUCTURE I

12:00-18:00 Free

18:00-19:30 Dinner

19:30-21:10 4. ASTRONOMICAL X-RAY OPTICS

21:10-22:30 5. POSTER SESSION I

TUESDAY, MARCH 7

08:00-09:00 6. NOVEL APPLICATIONS II

09:00-10:00 7. X-RAY SUPERMIRRORS

10:00-10:30 Break

10:30-11:50 8. GROWTH AND STRUCTURE II

11:50-18:00 Free

18:00-22:00 Banquet

WEDNESDAY, MARCH 8

08:00-09:00 9. GROWTH AND STRUCTURE III

09:00-10:00 10. MAGNETIC THIN FILMS AND X-RAY SCATTERING II

10:00-10:30 Break

10:30-11:50 11. NOVEL APPLICATIONS III

11:50-18:00 Free

18:00-19:30 Dinner

19:30-21:10 12. EUV LITHOGRAPHY

21:10-22:30 13. POSTER SESSION II

THURSDAY, MARCH 9

08:30-09:50 14. MAGNETIC THIN FILMS AND X-RAY SCATTERING III

09:50-10:30 Break

10:30-11:50 15. NOVEL APPLICATIONS IV

11:50-12:00 Closing Remarks

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DETAILED PROGRAM

Note: The abstracts below are in PDF format. You can view these files with the Acrobat Reader program, available free from Adobe, at www.adobe.com. (You might wish to configure your browser to read PDF files directly.)

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SUNDAY, MARCH 5

12:00-22:00 Registration

12:30-16:30 TUTORIAL on X-Ray and Neutron Scattering from Multilayers and Thin Films

12:30-13:30 Part I. Specular and Non-Specular X-Ray Scattering, T. Salditt

13:30-14:00 Break

14:00-15:00 Part II. Soft X-Ray Reflectivity and Scattering, E. Gullikson

15:00-15:30 Break

15:30-16:30 Part III. Multilayers and Neutron Scattering, P. Høghøj

19:00-22:00 Welcome Reception / Buffet Dinner

MONDAY, MARCH 6

08:00-08:10 Opening Remarks

08:10-09:10 1. NOVEL APPLICATIONS I

08:10-08:50 1.1 INVITED Multilayer-based Soft X-Ray Polarimetry F. Schäfers BESSY GmbH, Albert Einstein Strasse 15, D-12489 Berlin

08:50-09:10 1.2 Multilayer Gratings for the Extreme Ultraviolet Region: Experimental Measurements and Computational Modeling John F. Seely, Space Science Division, Code 7674, Naval Research Laboratory, Washington DC 20375 USA

09:10-10:10 2. MAGNETIC THIN FILMS AND X-RAY SCATTERING I

09:10-09:50 2.1 INVITED Magnetic thin film materials, P. Freitas, INESC

09:50-10:10 2.2 Depth-Resolved Magnetism across a 2 nm Co Layer Using Soft X-Ray Standing Waves J.B. Kortright and Sang-Koog Kim, Advanced Spectroscopy Department, Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 USA

10:10-10:40 Break

10:40-12:00 3. GROWTH AND STRUCTURE I

10:40-11:20 3.1 INVITED Sputter deposition of x-ray multilayers Ch. Morawe, European Synchrotron Radiation Facility, BP 220, F-38043, Grenoble Cedex, France

11:20-11:40 3.2 Microstructure and morphology of thin metallic films: computer simulations and experiments J. Dalla Torre 1,2 , G.H. Gilmer 1 , D.L. Windt 1 , F.H. Baumann 1 , R. Kalyanaraman 3 , J. Sapjeta 1 , and M. Djafari Rouhani 2 1. Bell Labs, Lucent Technologies, Murray Hill, NJ, USA 2. LAAS-CNRS & LPST-ESA5477 CNRS, Université Paul Sabatier, Toulouse, France 3. Oak Ridge National Labs, Oak Ridge, TN, USA

11:40-12:00 3.3 The Linear Continuum Model of Thin Film Growth D. G. Stearns, OS Associates, 1174 Castro St. Suite 250, Mountain View, California, 94040

12:00-18:00 Free

18:00-19:30 Dinner

19:30-21:10 4. ASTRONOMICAL X-RAY OPTICS

19:30-20:10 4.1 INVITED Interferometry: The Future of X-ray Astronomy Webster Cash, University of Colorado

20:10-20:50 4.2 INVITED Graded Multilayers for High-Energy Astrophysical Telescopes, Fiona Harrison, Caltech

20:50-21:10 4.3 Multilayer X-ray astronomical optics by means of Ni electroforming replications: status project O. Citterio (1), F. Mazzoleni(1), G. Pareschi(1), A. Mengali(2) and C. Misiano(2) (1) Osservatorio Astronomico di Brera, Via E. Bianchi 46, 23807 Merate (Lc), Italy (2) Centro Tecnologie del Vuoto (Ce.Te.V.), Carsoli (Aq), Italy

21:10-22:30 5. POSTER SESSION I

5.1 Continuous thermal annealing effects on the performances of soft-x-ray multilayer Mo/Si, Mo/C Ni/C mirrors T. Djavanbakht, J.-M. André, R. Barchewitz, Laboratoire de Chimie Physique, Université Paris 6, CNRS UMR 7614, 75231 Paris, France. V. Carrier, P. Troussel, CEA-DAM/DRIF/DCRE/SDE, Centre de Bruyères-le- Châtel, 91680 Bruyères-le-Châtel, France

5.2 Angular fluorescence distribution emitted by a metallic component in a periodic multilayer under grazing X-ray radiation F. Bridou*,J-C. Bouillard**, B. Capelle** * Laboratoire Charles Fabry de l'Institut d'Optique, BP 143, 91403 ORSAY CEDEX ** Laboratoire de Minèralogie-Cristallographie, Univ. P. et M. Curie, Tour 16, 4 Place Jussieu, 75532, PARIS CEDEX 05

5.3 Multilayers for soft X-rays and extreme-UV applications from Institut d'Optique- Orsay M.-F. Ravet, F. Delmotte, A. Raynal, F. Bridou, B. Pardo and B. Agius, Laboratoire Charles Fabry de l'Institut d'Optique- CNRS UMR 8501 Bâtiment 503- Centre Scientifique d'Orsay 91 403 Orsay- Cedex , France

5.4 Mo/Si-multilayers for EUV applications prepared by Pulsed Laser Deposition (PLD) St. Braun 1 , R. Dietsch 1 , M. Haidl 2 , Th. Holz 1 , H. Mai 1 , M. Mertin 2 , St. Müllender 2 , R. Scholz 3 1 Fraunhofer Institut Werkstoff- und Strahltechnik, Winterbergstr. 28, D-01277 Dresden, Germany 2 Carl Zeiss Oberkochen, D-73446 Oberkochen, Germany 3 Max-Planck-Institut für Mikrostrukturphysik Halle, Am Weinberg 2, D-06120 Halle/Saale, Germany

5.5 Interface morphology of Mo/Si MLs prepared by various deposition techniques A. Aschentrup, I. Kolina, Y. Chol Lim, G. Haindl, U. Kleineberg, U. Heinzmann, Faculty of Physics, University of Bielefeld, 33615 Bielefeld, Germany, E. Majkova, A. Anopchenko, M. Jergel, S. Luby, Institute of Physics, Slovak Academy of Sciences, 842 28 Bratislava, Slovak Republic, V. Holy, Faculty of Sciences, Masaryk University, 611 37 Brno, Czech Republic

5.6 Versatile Shutter Control of Radial Thickness Distribution for Figured Multilayer Fabrication Tadashi Hatano, Hiroo Umetsu, Minaji Furudate and Masaki Yamamoto, Research Institute for Scientific Measurements, Tohoku University Katahira 2-1-1, Aobaku, Sendai 980-8577, Japan

5.7 MOCVD in cross comparison with UHV e-beam evaporation as deposition techniques of EUV multilayers A. Aschentrup, O. Wehmeyer, F. Hamelmann, I. Kolina, G. Haindl, A. Klipp, T. Westerwalbesloh, E. Majkova, U. Kleineberg, P. Jutzi and U. Heinzmann, University of Bielefeld, Faculty of Physics and Faculty of Chemistry, Universit atsstra e 25, D{33615 Bielefeld

5.8 Evaluation of The Interface Morphology of Mo/Si and W/Si Multilayers by X-Ray Specular Reflectivity and Diffuse Scattering K. OMOTE, A. Ulyanenkov, R. MATSUO, K. SHIMIZU X-Ray Research Laboratory, Rigaku Corporation, Akishima, Tokyo, 196-8666, Japan M. ISHINO, M. NISHII and O. YODA Advanced Photon Research Center, Kansai Research Establishment, JAERI 25-1 Mii-minami, Neyagawa, Osaka, 572-0019, Japan

5.9 Mo/Si Multilayers for 13 nm Spectral Region S.S. Andreev, S.V. Gaponov, S.A. Gusev, E.B. Kluenkov, N.I. Polushkin, K.A. Prokhorov, N.N. Salashchenko Institute for Physics of Microstructures RAS, 603600 GSP-105, Nizhny Novgorod, Russia M.H. Haidl Carl Zeiss, D-73446 Oberkochen, FRG

5.10 Influence of ion beam irradiation on the structure of Ni/C multilayer during etching Yu. P. Pershyn, E. A. Bugaev, D. L. Voronov, V. V. Kondratenko, E. N. Zubarev, Kharkov State Polytechnic University, Ukraine, A. Yakshin FOM Institute for Plasma Physics, Nieuwegein, The Netherlands, A. G. Tour'yanskiy, A. V. Vinogradov, I. A.Artioukov, P. N. Lebedev Physical Institute, Moscow, Russia, J. Verhoeven FOM AMOLF, Amsterdam, The Netherlands

5.11 Interface and Annealing Effects in FeCo-Si Magnetic Multilayers Th. Krist, D. J. Müller, P. Schubert-Bischoff, J. Hoffmann and F. Mezei, BENSC Hahn-Meitner-Institut Berlin, Glienicker Str. 100, D 14109 Berlin, Germany

5.12 Soft X-ray resonant magnetic scattering of Fe/C multilayers O. Zaharko, H. Grimmer, PSI, Villigen, Switzerland, H.- Ch. Mertins, F. Schäfers, BESSY, Berlin, Germany

5.13 Faraday Rotation at the 2p-edges of Fe, Co and Ni H.-Ch. Mertins, F. Schäfers, A. Gaupp, W. Gudat, BESSY GmbH, Albert-Einstein-Strasse 15, D-12489 Berlin

5.14 Optimization of graded multilayer designs for hard X-ray telescopes Peter H. Mao, Leon M. Bellan, Fiona A. Harrison, Finn E. Christensen, and David L. Windt

5.15 The fabrication of Wolter I multilayer coated optics via electroforming: an update M. P. Ulmer(a), R. Altkorn(a), A. Madan(b), M. Graham(b), Y-W Chung(c) A. Krieger(d), C. Liu(e), B Lai(e) D. C. Mancini(e) and P. Takacs(f) a Dept. of Physics & Astron. Northwestern Univ., Evanston, IL 60208-2900 b ACT, Northwestern Univ. c Dept. Mat. Sci. & Engineering, Northwestern Univ d Radiation Science, Belmont, MA e APS, ANL, Argonne, IL f BNL, Brookhaven, NY

5.16 Multilayer Optics for Hard X-ray Astronomy S. Romaine 1 , A. Ivan 1 ; 2 , R. Bruni 1 , F.Christensen 3 , F.Harrison 4 , W.Craig 5 , P. Gorenstein 1 1 Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA 02138 2 Massachusetts Institute of Technology, Mass Ave, Cambridge, MA 02138 3 Danish Space Research Institute, Juliane Maries Vej 30, Copenhagen, DK-2100 4 California Institute of Technology, Pasadena, CA 91125 5 Columbia Astrophysics Laboratory, 136 S. Broadway, Irvington, NY 10533

5.17 X-ray multilayer coatings for use at energies above 100 keV D. L. Windt a , F. Christensen b , W. Craig c , C. Hailey c , F. Harrison d , M. Jimenez-Garate c , P. Mao d a Bell Labs, Lucent Technologies b Columbia Astrophysics Laboratory c Danish Space Research Institute d California Institute of Technology

5.18 Reduction of residual stress in EUV Mo/Si multilayer mirrors with post-deposition thermal treatments Claude Montcalm, Information Science and Technology, Lawrence Livermore National Laboratory, P.O. Box 808, L-395, Livermore, California 94551

5.19 Mo/Y and Mo/Sr normal incidence multilayer mirror for the 8-12 nm wavelength region Benjawan Sae-Lao and Claude Montcalm, Information Science and Technology Program, Lawrence Livermore National Laboratory, P.O. Box 808, L-395, Livermore, California 94551

5.20 MoRu/Be: a newly developed beryllium-based multilayer Sasa Bajt, Regina Soufli and James A. Folta, Information Science and Technology Program, Lawrence Livermore National Laboratory, 7000 East Avenue, L-395, Livermore, CA 94550

5.21 Moessbauer standing waves in multilayer structure: depth distribution of hyperfine fields M.A.Andreeva 1 , S.M.Irkaev 2 , V.G.Semenov 3 , K.A.Prokhorov 4 , N.N.Salashchenko 4 , A.I.Chumakov 5 , R.Rüffer 5 1 Department of Physics, Moscow State University, 117234 Moscow, Russia; 2 Institute of Analytical Instrumentation RAS, 198103 St. Petersburg, Russia; 3 Institute of Chemistry, St.Petersburg State University, 199164 St. Petersburg, Russia; 4 Institute for Physics of Microstructures RAS, 603600, Nizhny Novgorod, Russia; 5 European Synchrotron Radiation Facility, BP 220, F-38043 Grenoble, France. 2

5.22 The study of magnetic Co/Pt superlattices by means of X-ray specular reflectivity and diffuse scattering I.P.Dolbnya and P.D.Kim, DUBBLE CRG / ESRF, B.P. 220, F-38043 Cedex, France Akademgorodok, 660036

5.23 Novel multilayer for the improved detection of boron by XRF J. Wiesmann, P. Ricardo and C. Michaelsen Institute of Materials Research, GKSS Research Center, Max-Planck-Str., 21502 Geesthacht, Germany, C. Nowak HASYLAB at DESY, 22603 Hamburg, Germany

TUESDAY, MARCH 7

08:00-09:00 6. NOVEL APPLICATIONS II

08:00-08:40 6.1 INVITED Soft x-ray ellipsometer using free-standing multilayer polarizer Tsuneyuki Haga. NTT Telecommunications Energy Laboratories, 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-0198 Japan

08:40-09:00 6.2 Calibration of a phase-shifting correcting layer for EUV optics, by in situ interferometry Denis JOYEUX, Pierre PICHON and Daniel PHALIPPOU, Laboratoire Charles Fabry, Institut d'Optique, BP 147 - 91403 Orsay cedex, FRANCE Joseph BRAAT and Mandeep SINGH, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands Markus HAIDL and Udo DINGER, Carl Zeiss, Carl-Zeiss-Strasse, 73446 Oberkochen, GERMANY

CANCELLED: Development and calibration of beamsplitters for use on interferometry at 13.9 nm. S. Hubert % , F. Delmotte = , M.F. Ravet = , F. Bridou = , M. Idir * , G. Soullié \ , G. Cauchon # , Ph. Zeitoun % , B. Agius = % Laboratoire de Spectroscopie Atomique et Ionique, Bât. 350 centre scientifique - 91403 Orsay, = Laboratoire Charles Fabry de l'Institut d'optique, Bât. 503 centre scientifique- 91403 Orsay, \ Commisariat à l'Énergie Atomique, Centre d'étude- BP 12, 91680 Bruyères-le-Châtel, # National Institute of Standards and Technology, Radiation Physics Division, bureau DR Stop 8410, Gaithersburg MD 20899-8410

09:00-10:00 7. X-RAY SUPERMIRRORS

09:00-09:40 7.1 INVITED Design of X-Ray Supermirrors Igor V.Kozhevnikov, Lebedev Physical Institute Leninsky, prospect 53, Moscow 117924, Russia

09:40-10:00 7.2 Further Development of Multilayer Supermirrors for Hard X-Ray Optics K. Yamashita, H. Kunieda*, Y. Tawara, K. Tamura, Y. Ogasaka, K. Haga, and T. Okajima, Department of Physics, Nagoya University Furo-cho, Chikusa-ku, Nagoya 464-8602, Japan * Institute of Space and Astronautical Science, 3-1-1 Yoshinodai, Sagamihara 229-8510, Japan

10:00-10:30 Break

10:30-11:50 8. GROWTH AND STRUCTURE II

10:30-11:10 8.1 INVITED Pulsed Laser Deposition of X-Ray Optical Multilayers R. Dietsch 1) , Th.Holz 1) , H.Mai 1) , R.Scholz 2) 1)Fraunhofer Institute Material and Beam Technology Winterbergstrasse 28, D-01277 Dresden, Germany 2)Max-Planck-Institute of Microstructure Physics, Weinberg 02, D-06120 Halle, Germany

11:10-11:30 8.2 Stress and Intermixing in Mo/Si Multilayers J.M. Freitag and B.M. Clemens, Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305-2205.

11:30-11:50 8.3 Development and calibration of beamsplitters for use on interferometry at 13.9 nm. F. Delmotte 1 , M.F. Ravet 1 , F. Bridou 1 , B. Agius 1 S. Hubert 2 , G. Soullié 3 , Ph. Zeitoun 2 1 Laboratoire Charles Fabry de l'Institut d'Optique, Bât. 503 centre scientifique- 91403 Orsay, 2 Laboratoire de Spectroscopie Atomique et Ionique, Bât. 350 centre scientifique- 91403 Orsay, 3 Commisariat à l'Énergie Atomique, Centre d'étude- BP 12, 91680 Bruyères-le-Châtel.

11:50-18:00 Free

18:00-22:00 Banquet

WEDNESDAY, MARCH 8

08:00-09:00 9. GROWTH AND STRUCTURE III

08:00-08:40 9.1 INVITED Molecular dynamics simulation of ion effects on the growth of thin films Barend J. Thijsse, Bouke Bunnik, Edwin Haddeman, Carin de Hoog, Peter Klaver 1 , Delft University of Technology, Dept of Materials Science, Center for Research on Ion-Solid Interactions and Surfaces (CRISIS), Delft, NETHERLANDS. 1 FOM-Rijnhuizen Institute for Plasma Physics, Nieuwegein, NETHERLANDS.

08:40-09:00 9.2 Effects of energetic particles on DC sputter growth of W/B4C multilayer x-ray mirrors for the water window Fredrik Eriksson a , Jens Birch, Thin Film Physics Division, Department of Physics (IFM), Linkoping University, 581 83 Linkoping, Sweden Göran A. Johansson, Hans M. Hertz, Biomedical & X-Ray Physics, Royal Institute of Technology, 100 44 Stockholm, Sweden

09:00-10:00 10. MAGNETIC THIN FILMS AND X-RAY SCATTERING II

09:00-09:40 10.1 INVITED Quantifying Interfacial Magnetic Roughness in Multilayers Dr. Y.U. Idzerda, Naval Research Laboratory Washington, DC USA

09:40-10:00 10.2 Soft x-ray characterization of structural and magnetic heterogeneity in thin films and multilayers Eric E. Fullerton, Gabriel Zeltzer, Kentaro Takano, Dieter Weller (IBM Almaden Research Center), J. B. Kortright, Sang-Koog Kim (Materials Science Division, Lawrence Berkeley National Laboratory)

10:00-10:30 Break

10:30-11:50 11. NOVEL APPLICATIONS III

10:30-11:10 11.1 INVITED A Soft-X-Ray Imaging Microscope Based on a Multilayer-Coated Schwarzschild Objective M. Toyoda,* Y. Shitani, M. Yanagihara, T. Ejima, M. Yamamoto and M. Watanabe, Research Institute for Scientific Measurements, Tohoku University 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

11:10-11:30 11.2 The application of multilayers to generate radiation in a wavelength region from 1 to 20 nm, using electrons in the low MeV energy range. B. Lastdrager and J. Verhoeven, FOM Institute for Atomic and Molecular Physics, Kruislaan 407, 1098SJ Amsterdam

11:30-11:50 11.3 Broadband multilayer mirrors for EUV/x-ray optics at normal and grazing incidence Zhanshan Wang 1,2 Jianlin Cao 1 , and Alan G. Michette 2 1 Changchun Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Changchun 130022, P.O.Box 1024, China 2 Department of Physics, King's College, Strand, London WC2R 2LS,UK

11:50-18:00 Free

18:00-19:30 Dinner

19:30-21:10 12. EUV LITHOGRAPHY

19:30-20:10 12.1 INVITED EUV Lithography Eberhard Spiller EUV LLC, Livermore National Laboratory Livermore CA 94551

20:10-20:50 12.2 INVITED Metrology of multilayer coated optics for EUV lithography Jeffrey Bokor, EECS Department, University of California Berkeley, CA 94720 and Center for X-ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720

20:50-21:10 12.3 Progress in multilayer reflective coatings for extreme-ultraviolet lithography J.A. Folta, S. Bajt, R.F. Grabner, M.A. Schmidt, R. Soufli, E. Spiller, C.C. Walton, M. Wedowski, and C. Montcalm, Information Science and Technology, Lawrence Livermore National Laboratory, P.O. Box 808, L-395, Livermore, California 94551.

21:10-22:30 13. POSTER SESSION II

13.1 Multilayer coated optics for an alpha-class extreme ultraviolet lithography system C. Montcalm, R.F. Grabner, R.M. Hudyma, M.A. Schmidt, E. Spiller, C.C. Walton, M. Wedowski, and J.A. Folta, Information Science and Technology, Lawrence Livermore National Laboratory, P.O. Box 808, L-395, Livermore, California 94551

13.2 Stability of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography Marco Wedowski, Sasa Bajt, and James A. Folta, Information Science & Technology Program, Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, California 94551, Eric M. Gullikson, Ulf Kleineberg*, and Eric Ziegler**, Center for X-ray Optics, Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California 94720, Leonard E. Klebanoff, Michael E. Malinowski, and W. Miles Clift, Materials Science & Technology Department, Sandia National Laboratories, P.O. Box 969, Livermore, California 94551

13.3 Characterization of EUV multilayer masks using X-ray reflectivity and Auger electron spectroscopy P. J. S. Mangat 1 , J. Slaughter 2 , S. Hector 1 , J. Wasson,1 S. Bajt 3 , P. Kearney 3 1 Motorola, Advanced Products Research and Development Laboratory, 2 Motorola Labs, Physical Sciences Research Laboratories 3 Lawrence Livermore National Laboratories

13.4 Whispering Gallery Effect in X-Ray Optics Vladimir I.Ostashev, Oleg N.Gilev, and Nikolai A.Havronin Russian Federal Nuclear Center - VNIITF, Snezhinsk, 456770 Chelyabinsk region, Russia Inna N.Bukreeva and Igor V.Kozhevnikov Lebedev Physical Institute, Leninsky prospect 53, 117924 Moscow, Russia

13.5 Fabrication and characterization of EUV multilayer mirrors with a small spectral reflection bandwidth Y. C. Lim,T. Westerwalbesloh, A. Aschentrup, O. Wehmeyer, G. Haindl, U. Kleineberg,T. Wiesenthal, P. Siffalovic, M. Spieweck, M. Drescher, U. Heinzmann, University of Bielefeld, Faculty of Physics, Universitätsstraße 25, D-33615 Bielefeld, Germany

13.6 Curved multilayers in synchrotron optics Ch. Morawe, O. Hignette, J-Ch. Peffen, E. Ziegler, European Synchrotron Radiation Facility BP 220, F-38043, Grenoble Cedex, France

13.7 Multilayer monochromator with improved resolution and low background for the soft-x-ray domain R. Barchewitz, J.-M. André, Laboratoire de Chimie Physique, Université Paris 6, CNRS UMR 7416, 75231 Paris 5, France. M.-F. Ravet, A. Raynal, B. Pardo, F. Bridou, B. Agius, Laboratoire Charles Fabry de l'Institut d' Optique, CNRS UMR 8501, 91403 Orsay, France. G. Julié, A. Bosseboeuf, R. Laval, Institut d'Electronique Fondamentale, CNRS UMR 8622, 91403 Orsay,France. C. Rémond, G. Soullié, CEA-DAM, 91680 Bruyères-le-Châtel, France. M. Fialin, Centre de Microanalyse CAMPARIS, Université Paris 6, CNRS ESA 7058, 75005 Paris 5, France

13.8 Use of DWBA and Perturbation Theory in X-Ray Control of the Surface Roughness Igor V.Kozhevnikov and Mikhail V.Pyatakhin, Lebedev Physical Institute, Leninsky prospect 53, Moscow 117924, Russia

13.9 EUV multilayers with high thermal stability T. Feigl, S. Yulin, N. Kaiser, Fraunhofer-Institut für Angewandte Optik und Feinmechanik, Schillerstrasse 1, D - 07745 Jena

13.10 Global optimization and reflectivity data fitting for X-ray multilayer mirrors by means of genetic algorithms M. Sanchez del Rio (1) and G. Pareschi (2) (1) European Synchrotron Radiation Facility, BP 220, 38043 Grenoble Cedex, France (2) Osservatorio Astronomico di Brera, Via E. Bianchi 46, 23807 Merate (Lc), Italy

13.11 Optimization of a simulated annealing algorithm for the design and characterization of x-ray multilayers. E. Ziegler, A. Basille, Cl. Ferrero, J.M. Revillard, Ch. Morawe, European Synchrotron Radiation Facility, BP 220 38043 Grenoble Cedex, France

13.12 Optical Components for Polarization Analysis of Soft X-ray Radiation H. Grimmer, O. Zaharko (PSI, Villigen) H.-Ch. Mertins, F. Schäfers (BESSY, Berlin)

13.13 A comparative analysis of the interface roughness and abruptness of SiGe/Si strained superlattices by means of XRD, RBS, TEM and SIMS techniques S. Bozzo a , S. Milita b , J.-L. Lazzari a , P. Gergaud b , O. Thomas b , C. Guichet c , B. Hollaender d , S. Mesters d , C. Cytermann e , R. Beserman e a CRMC2-CNRS, Campus de Luminy, case 913, 13288 Marseille cedex 9, FRANCE. b MATOP, Faculté des sciences de St Jérôme, 13397 Marseille cedex 20, FRANCE c LPIPM, Faculté des sciences de St Jérôme, 13397 Marseille cedex 20, FRANCE d ISI-IT, KFA Forschungszentrum Jülich GmbH, D-52425 Jülich, GERMANY. e Solid State Physics, Technion Institute of Technology, Haifa 32000, ISRAËL

13.14 Interface roughness of the refractory metal based X-ray multilayers prepared by various deposition techniques S. Luby, E. Majkova. M. Jergel, Institute of Physics, Slovak Academy of Sciences, 842 28 Bratislava, Slovakia F. Hamelmann, G. Haindl, U. Kleineberg, U. Heinzmann, Faculty of Physics, University of Bielefeld, 33615 Bielefeld, Germany

13.15 Diffusion barriers in Sc/Si multilayers D. L. Voronov, E. N. Zubarev, V. V. Kondratenko, Yu. P. Pershyn, A. I. Fedorenko Kharkov State Polytechnic University, Ukraine V. E. Levashov, A. V. Vinogradov, I. A. Artioukov, P.N. Lebedev Physical Institute, Moscow, Russia

13.16 Reflectivity enhancement of multilayer neutron mirrors by ion polishing in combination with sputter deposition Kazuhiko SOYAMA*, Wakana ISHIYAMA** Masayuki SHIRAISHI** and Katsuhiko MURAKAMI** *Japan Atomic Energy Research Institute, Tokai, Naka, Ibaraki, 319-11 JAPAN **Nikon Corporation, Nishi-ohi, Shinagawa, Tokyo 140 JAPAN

13.17 Interface characterization in Pt/C x-ray multilayer Y. Ogasaka, K. Tamura, K. Yamashita, H. Kunieda, Y. Tawara, K. Haga, T. Okajima, Y. Hidaka, S. Ichimaru, S. Takahashi, S. Fukuda, A. Goto and H. Kito Department of Physics, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8602, Japan Y. Tsusaka, K. Yokoyama and S. Takeda Faculty of Science, Himeji Institute of Technology, Ako-gun, Hyougo 678-1201, Japan G. S. Lodha Centre for Advanced Technology, Indore 452 013, India S. N. Gose and B.N. Dev Institute of Physics, Bhubaneswar 751 005, India

13.18 Determination of the layered structure in Mo/Si multilayers using a laterally graded multilayer A.E. Yakshin, E. Louis, T.P.C. Klaver, P.C. Görts, E.L.G. Maas, and F. Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen, Edisonbaan 14, P.O.Box 1207, 3430 BE Nieuwegein, The Netherlands

13.19 X-Ray Studies of the Roughness of Thin Films Victor Asadchikov and Yury Krivonosov Institute of Crystallography, Leninsky prospect 59, Moscow 117333, Russia Angela Duparre Fraunhofer Institute for Applied Optics and Precision Engineering, IOF Schillerstrasse 1, D-07745, Jena, Germany Igor Kozhevnikov Lebedev Physical Institute, Leninsky prospect 53, Moscow 117924, Russia

13.20 See 6.2, Tuesday, March 7

13.21 Sputtered V/Al2O3 multilayer x-ray mirrors for the water window A.Nefedov and H.Zabel, Ruhr-Universität Bochum, Institut für Experimentalphysik/Festkörperphysik, Universitätsstrasse 150, D-44780 Bochum, Germany; F.Schäfers BESSY GmbH, Albert Einstein Strasse 15, D-12489 Berlin

13.22 Supermirrors for the Surface Analysis Beamline at BESSY-II Bernard Vidal, X-RAY and Neutron Optics Groupe, LORXN, L2MP, CNRS-UDSAM, Faculte des Sciences de St Jérome, Avenue, Escadrille Normandie Niemen F-13397 Marseille CEDEX 20, FRANCE; Alexei Erko, BESSY GmbH, Albert-Einstein Str. 15, D-12489, Berlin, GERMANY

13.23 Soft X-ray Reflectivity and layer Structure Evaluation of Ni/C/Ti/C and Co/C/Ti/C Multilayers Hisataka Takenaka, Hisashi Ito, Yasuji Muramatsu*, and Eric M. Gullikson**; NTT Advanced Technology Co., Musashino, Tokyo 180-8585, Japan; *NTT Lifestyle and Environmental Technology Laboratories, Musashino, Tokyo 180-8585, Japan; ** Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA

THURSDAY, MARCH 9

08:30-09:50 14. MAGNETIC THIN FILMS AND X-RAY SCATTERING III

08:30-09:10 14.1 INVITED Resonant Magnetic X-ray and Neutron Scattering from Rough Interfaces S.K.Sinha (1) , S.A. Stepanov (2) and R.M. Osgood (3); (1) Advanced Photon Source, Argonne National Laboratory, Argonne, IL (2) Illinois Institute of Technology, Chicago, IL and BioCAT at Advanced Photon Source, Argonne National Laboratory, Argonne, IL (3) Materials Science Division, Argonne National Laboratory; Argonne, IL Present Address: 3-M Corporation, St. Paul, MN

09:10-09:30 14.2 Ce 5d and 4f Induced Magnetic Profiles in Multilayers Probed by XRMS N. Jaouen 1 , J.M. Tonnerre 1 , E. Bontempi 2 , D. Raoux 1 , A. Rogalev 3 , N. Brooks 3 , M. Münzenberg 4 , W. Felsch 4 1 Laboratoire de Cristallographie, CNRS, B.P. 166, 38042 Grenoble Cedex 9, France. 2 Laboratorio di Strutturistica Chimica, Università di Brescia, 25123 Brescia, Italy. 3 European Synchrotron Radiation Facility, B.P. 230, 38043 Grenoble Cedex, France. 4 I. Physikalisches Institut, Universität Göttingen, Bunsenstr. 9, 37073 Göttingen, Germany

09:30-09:50 14.3 Soft X-ray magnetic circular dichroism in Fe0.50Co0.48V0.02/Ti multilayer in transmission for polarimetry and component resolved magnetism O. Zaharko, H. Grimmer, PSI, Villigen, Switzerland H.- Ch. Mertins, F. Schäfers, BESSY, Berlin, Germany A. Cervellino, LfK, ETH Zurich, Switzerland

09:50-10:30 Break

10:30-11:50 15. NOVEL APPLICATIONS IV

10:30-11:10 15.1 INVITED Coherent Hard X-Ray Imaging P. Cloetens a , W. Ludwig a , C. Morawe a , O. Hignette a , J.P. Guigay a,b , and M. Schlenker b; a European Synchrotron Radiation Facility, B.P. 220, F-38043 Grenoble, France b CNRS, Lab. Louis Neel, B.P. 166, F-38042 Grenoble, France

11:10-11:30 15.2 Reflection wave-front error compensation by surface milling at a layer prepared on top of an EUV multilayer mirror Masaki Yamamoto, Center for Soft X-ray Microscopy RISM, Tohoku University, 2-1-1 Katahira Sendai 980-8577 Japan

11:30-11:50 15.3 X-ray waveguides F. Pfeiffer 1 , T. Salditt 1 , P. Høghøj 2 , I. Anderson 2 , N. Schell 3 1 Sektion Physik der Ludwig-Maximilians-Universitaet Muenchen, LS Peisl, Geschwister-Scholl-Platz 1, 80539 Muenchen, Germany 2 Institut Laue-Langevin, B.P. 156, 38042 Grenoble Cedex 9, France 3 ROBL at the ESRF, Grenoble Cedex, France

11:50-12:00 Closing Remarks