The 10th International Conference
on the
Physics of X-Ray Multilayer Structures
Program
Sunday Monday Tuesday Wednesday Thursday
SUNDAY, FEBRUARY 14
16:00-22:00 Registration
19:00-22:00 Welcome Reception
MONDAY, FEBRUARY 15
7:00-8:15 Breakfast
8:15-8:30 Opening Remarks
8:30-9:50 Oral Session 1: PULSED SOURCE MULTILAYERS Session Chair: Franz Schaefers
8:30-9:00 1.1 INVITED Multilayer optics for Femtosecond/Attosecond
Sources Andrew Aquila1,2, S. Bajt1, M. Barthelmess1,
and E. Gullikson3 1: Photon Science, DESY, 22607 Hamburg, Germany 2:
Center for Free-Electron Laser Science, DESY, 22607 Hamburg, Germany 3: Center
for X-ray Optics, LBNL, 94720, Berkeley, USA
9:00-9:20 1.2 Applications of multilayer-coated optics in free electron laser experiments Saša Bajt1 , Henry Chapman2,3, Andrew Aquila1,2, Miriam Barthelmess1 1: Photon Science, DESY, 22607 Hamburg, Germany, 2: Center for Free-Electron Laser Science, DESY, 22607 Hamburg, Germany, 3: University of Hamburg, 22607 Hamburg, Germany
9:20-9:40 1.3 Multilayer Bragg-Fresnel optics for nano-focusing of coherent femtosecond soft X-ray pulses in Coherent Diffractive Imaging experiments Christian Späth, Michael Hofstetter, Ulf Kleineberg, Ludwig Maximilians, University Munich, Faculty of Physics, D-85748 Garching, Germany; M. Dierolf, P. Thibault, F. Pfeiffer, Department of Physics, Technical University of Physics, 85748 Garching/Munich, Germany
9:40-10:10 1.4 INVITED Design, fabrication and characterization of chirped multilayer soft X-ray mirrors for attosecond pulses in the 100-190 eV photon energy range Michael Hofstetter, Andy Aquila, Martin Schultze, Elefterios Goulielmakis, Ralf Ernstorfer, Markus Fiess, Justin Gagnon, Bert Nickel, Markus Doblinger, Ferenc Krausz, Ulf Kleineberg
10:10-10:40 Break
10:40-12:00 Oral Session 2: MULTILAYER STABILITY Session Chair: David Windt
10:40-11:00 2.1 Damage studies of multilayer optics for XUV FELs E. Louis1, A.R. Khorsand1, R. Sobierajski1,2, E.D. van Hattum1, T. Tsarfati1, M. Jurek2, D. Klinger2, J.B. Pelka2, L. Juha3, J. Chalupsky3, J. Cihelka3, V. Hajkova3, U. Jastrow4, S. Toleikis4, H. Wabnitz4, K. Tiedtke4, J. Gaudin5, and F. Bijkerk1,* 1: FOM-Institute for Plasma Physics Rijnhuizen, Edisonbaan 14, NL-3430 BE Nieuwegein, The Netherlands; *: also at MESA+ Institute for Nanotechnology, University of Twente, The Netherlands; 2: Institute of Physics Polish Academy of Sciences, Al. Lotników 32/46, PL 02-668 Warszawa, Poland; 3: Institute of Physics AS CR, Na Slovance 2, 182 21 Prague 8, Czech Republic; 4: HASYLAB/DESY, Notkestrasse 85, D-22603 Hamburg, Germany; 5: European XFEL/DESY, Notkestr. 85, D-22607 Hamburg, Germany
11:00-11:20 2.2 Damage analysis of EUV Mo/Si multilayer coating irradiated by IR femtosecond pulses M. Suman(1,2), G. Monaco(1,2), P. Zuppella(1,2), M. G. Pelizzo(2), F. Ferrari(3), M. Lucchini(3), M. Nisoli(3), D. L. Windt(4) and P. Nicolosi(1) 1: Information Engineering Department, University of Padova, via Gradenigo 6B, Padova, 35131 Italy; 2: National Research Council- National Institute for the Physics of the Matter, LUXOR Laboratory, via Gradenigo 6B, Padova, 35131 Italy; 3: Ultras-INFM UdR di Milano, Dipartimento di Fisica, Politecnico di Milano, Milano, Italy; 4: Reflective X-ray Optics LLC, 1361 Amsterdam Ave., Suite 3B, New York, NY 10027, USA
11:20-11:40 2.3 Yesterday’s Multilayers – Tomorrow’s Optics
K. Friedrich, Ch. Morawe, J.-Ch. Peffen, European Synchrotron Radiation
Facility, BP 220, 38043 Grenoble Cedex 9, France
11:40-12:00 2.4 Diffusion in Mo/Si based multilayers, a story from 77K to 770K R.W.E. van de Kruijs1, S. Bruijn1, V. de Rooij-Lohmann1, A. Yakshin1, F. Bijkerk1,* 1: FOM-Institute for Plasma Physics Rijnhuizen, Edisonbaan 14, NL-3430 BE Nieuwegein, The Netherlands; *: also at MESA+ Institute for Nanotechnology, University of Twente, The Netherlands
12:00-18:30 Free
18:30-20:00 Dinner
20:00-22:00 POSTER SESSION I
P1.1 Small d-spacing Mo/B4C
multilayers: stress study M. Barthelmess1, S. Bajt1,
and A. Aquila1,2 1: HASYLAB, DESY, 22607 Hamburg, Germany; 2: Center
for Free-Electron Laser Science, DESY, 22607 Hamburg, Germany
P1.2 Supermirror optimisation for instrument optical devices at the ILL T. Bigault, K. Ben Saidane, G. Bisig, A. Bouvier, N. Gauthier, D. Gorny and K. H. Andersen Institut Laue-Langevin, 6 rue Jules Horowitz, B.P. 156, 38042 Grenoble Cedex 9, France
P1.3 Dynamic diffusion rates during evolution of
Mo-Si interlayers under annealing J. Bosgra1, A.E. Yakshin1,
R.W.E. van de Kruijs1, F. Bijkerk1,2 1:FOM Institute for Plasma Physics, P.O. Box 1207, 3430 BE Nieuwegein, The
Netherlands; 2: MESA+, University of Twente, P.O. Box 217, 7500 AE Enschede,
The Netherlands
P1.4 Multilayer mirrors for attosecond pulses C.
Bourassin-Bouchet, S. de Rossi, F. Delmotte, E. Meltchakov, F. Bridou, Y.
Menesguen Laboratoire Charles Fabry, Institut d’Optique, Univ Paris sud, CNRS,
RD128 Campus Polytechnique, 91127 Palaiseau, France
P1.5 Optical characterization of FEL multilayer optics damaged by multiple pulse laser beam N. Mahne1, A. Giglia1, A. Bianco2, C. Svetina2, S. Nannarone3 1: CNR-Laboratorio TASC-INFM, Statale 14 - km 163,5, 34149 Basovizza, Trieste ITALY; 2: Sincrotrone Trieste S.C.p.A., Strada Statale 14 - km 163,5, 34149 Basovizza, Trieste ITALY; 3: Università di Modena e Reggio Emilia, Dip. Ing. Materiali, V. Vignolese
P1.6 Space environment experiments of SiC/Mg, Mo/Si and
SiC/Si multilayers for astronomical observation Jingtao Zhu, Haochuan Li,
Liang Bai, Qiushi Huang, Xiaoqiang Wang, Zhanshan Wang, Lingyan Chen, Institute
of Precision Optical Engineering (IPOE), Physics Department, Tongji University,
Shanghai 200092, China
P1.7 X-ray focusing polychromator using elliptically
curved, laterally graded multilayers Tadashi Hatano1, Tetsuo
Harada2, Tadashi Matsushita3, Etsuo Arakawa4
and Yasuo Higashi5 1: IMRAM, Tohoku Univ., 2-1-1 Katahira, Aoba-ku,
Sendai 980-8577, Japan; 2: LASTI, Univ. of Hyogo, 3-1-2 Kouto, Kamigoori-cho,
Ako-gun, Hyogo 678-1205, Japan; 3: Photon Factory, Institute of Materials
Structure Science, KEK, 1-1 Oho, Tsukuba 305-0801, Japan; 4: Department of Physics,
Tokyo Gakugei Univ., 4-1-1 Nukuikitamachi, Koganei, Tokyo 184-8501, Japan; 5:
Mechanical Engineering Center, KEK, 1-1 Oho, Tsukuba 305-0801, Japan
P1.8 A 100-µm-Thick Full Multilayer Laue Lens Structure
Chian Liu, B. Shi, Z. Cai, N. Jahedi, and A. T. Macrander, X-ray Science
Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
P1.9 Reduction of interlayer thickness by
low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection
V.I.T.A. de Rooij-Lohmann1, A. E. Yakshin1, E. Zoethout1,
J. Verhoeven2, F. Bijkerk1,3 (presented by S. Nyabero1)
1. FOM Institute for Plasma Physics Rijnhuizen, P.O. Box 1207, 3430 BE
Nieuwegein, The Netherlands; 2. Kamerlingh Onnes Laboratory, Leiden University,
P.O. Box 9504, 2300 RA Leiden, The Netherlands; 3. MESA+ Institute for
Nanotechnology, University Twente, P.O. Box 217, 7500 AE Enschede, The
Netherlands.
TUESDAY, FEBRUARY 16
7:00-8:20 Breakfast
8:20-9:40 Oral Session 3: SURFACES, GROWTH AND PROPERTIES I Session Chair: Franck Delmotte
8:20-8:40 3.1 EUV interferometry on multilayer reflection phase manipulation by surface milling Tadashi Hatano, Toshihide Tsuru, Yuh Sakai, Shodo Ogasawara, Hiroo Umetsu and Masaki Yamamoto IMRAM, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
8:40-9:00 3.2 Low-energy ion beam irradiation of X-ray mirrors: optimization of the surface finish for multilayer deposition Eric Ziegler a, Luca Peverini, Nicolas Vaxelaire b, Amparo Rommeveaux a, Igor V. Kozhevnikov c a European Synchrotron Radiation Facility, BP 220, 38043, Grenoble cedex, France b IM2NP, Faculté des Sciences et Techniques, 13397, Marseille cedex 20, France c Institute of Crystallography, Leninsky prospect 59, Moscow 119333, Russia
9:00-9:20 3.3 Effects of energetic particles during growth
of short period Pt/Mg X-ray multilayer mirrors Fredrik Eriksson, Hafiz
Muhammad Sohail, Jens Birch Thin Film Physics Division, Department of Physics
(IFM), Linköping University, 581 83 Linköping, Sweden; Peter Münger, Theory and Modeling,
Department of Physics (IFM), Linköping University, 581 83 Linköping, Sweden
9:20-9:40 3.4 Spontaneous Short-Range Ordering in Artificial Mo/V(001) Superlattices with Modulation Periods < 2 Monolayers Jens Birch,a Matts Björck,b and Naureen Ghafoor,a a: Department of Physics, Chemistry, and Biology, Linköping University, S-581 83 Linköping, Sweden; b: MAX-lab, Lund University, P.O. Box 118, S-221 00 Lund, Sweden
9:40-10:10 Break
10:10-12:10 Oral Session 4: APPLICATIONS I Session Chair: Eric Louis
10:10-10:40 4.1 INVITED High efficiency blazed multilayer gratings for EUV and soft x-rays Dmitriy L. Voronov,a Rossana Cambie,a Minseung Ahn,b Erik H. Anderson,a Chih-Hao Chang,b Eric M. Gullikson,a Ralf K. Heilmann,b Farhad Salmassi,a Mark L. Schattenburg,b Valeriy V. Yashchuk,a Tony Warwick,a Leonid. I. Goray,c and Howard A. Padmorea, a: Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720; b: Space Nanotechnology Laboratory, Massachusetts Institute of Technology, 70 Vassar St., Cambridge, MA02139; c: International Intellectual Group, Inc., P.O. Box 131611, Staten Island, New York 10313
10:40-11:10 4.2 INVITED EUVL metrology at PTB for the European EUV Lithography Program F. Scholze, C. Laubis, A. Kato, G. Ulm, Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany
11:10-11:30 4.3 Multilayer development for EUV Lithography
H. Enkisch, S. Müllender, G. von Blanckenhagen, Carl Zeiss SMT AG,
Rudolf-Eber-Strasse 2. D-73447 Oberkochen, Germany CANCELLED
11:30-11:50 4.4 Infrared antireflective coating for EUV mirrors based on a DLC/Si multilayer P. Gawlitza1, St. Braun1, A. Leson1, W. Soer2, V. Banine31: IWS Dresden, Fraunhofer Institute for Material and Beam Technology, Winterbergstr. 28, 01277 Dresden, Germany; 2: Philips Research Laboratories, Eindhoven, The Netherlands; 3: ASML, De Run 6501, Veldhoven, The Netherlands
11:50-12:10 4.5 Depth-graded multilayers for tailored broadband mirrors R. Dietsch1, M. Krämer1, Th. Holz1, D. Weißbach1, K. Mann2 1: AXO DRESDEN GmbH, Siegfried-Raedel-Str. 31, 01809 Heidenau, Germany; 2: Laser-Laboratorium Göttingen e.V., Hans-Adolf-Krebs-Weg 1, 37077 Göttingen, Germany
12:10-18:00 Free
18:00-22:00 Banquet
WEDNESDAY, FEBRUARY 17
7:00-8:30 Breakfast
8:30-9:40 Oral Session 5:
SURFACES, GROWTH AND PROPERTIES II
Session Chair: Jens Birch
8:30-9:00 5.1 INVITED Effect of interfacial roughness correlation on diffuse intensity in a neutron supermirror R. Maruyama, D. Yamazaki, T. Ebisawa, and K. Soyama J-PARC Center, Japan Atomic Energy Agency, Tokai, Ibaraki 319-1195, Japan
9:00-9:20 5.2 GISAXS – a versatile inspection technique for multilayer interfaces P. Siffalovic1, E. Majkova1, M. Jergel1, L. Chitu1, Y. Halahovets1, K. Vegso1, S. Luby1, A. Timmann2, S. V. Roth2, G. A. Maier3, J. Keckes4, T. Tsuru5, T. Harada5, M. Yamamoto5, U. Heinzmann6, A. Hembd7, F. Hertlein7, J. Wiesmann7 1: Institute of Physics SAS, Dubravska cesta 9, 84511 Bratislava, Slovakia; 2: HASYLAB / DESY, Notkestr. 86, 22603 Hamburg, Germany; 3: Materials Center Leoben Forschung GmbH, Roseggerstr. 12, A-8700 Leoben, Austria; 4: Erich Schmid Institute for Materials Science, Jahnstr. 12, A-8700 Leoben, Austria; 5: IMRAM, Tohoku University, 2-1-1 Katahira, Aobaku, Sendai 980-8577, Japan; 6: Fakultaet fuer Physik, Universitaet Bielefeld, Postfach 100131, 33501 Bielefeld, Germany; 7: Incoatec GmbH, Max-Planck-Strasse 2, 21502 Geesthacht, Germany
9:20-9:40 5.3 Time-Resolved X-Ray Reflectometry using a Laterally Graded Multilayer Focusing Polychromator Tadashi Matsushitaa, Etsuo Arakawab, Tadashi Hatanoc, Tetsuo Haradad, Yasuo Higashie, Yohko F. Yanof a: Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization, Tsukuba, Ibaraki, Japan; b: Department of Physics, Tokyo Gakugei University, Koganei, Tokyo, Japan; c: Center for Advanced Microscopy and Spectroscopy, IMRAM, Tohoku University, Katahira, Aoba-ku, Sendai, Japan; d: LASTI, Univ. of Hyogo,Kamigoori-cho, Ako-gun, Hyogo, Japan; e: Engineering Center, High Energy Accelerator Research Organization, Tsukuba, Ibaraki, Japan f Research Organization of Science & Engineering, Ritsumeikan University, Kusatsu-shi, Shiga, Japan
9:40-10:10 Break
10:10-12:00 Oral Session 6: APPLICATIONS II Session Chair: Sasa Bajt
10:10-10:40 6.1 INVITED Multilayers for neutron applications: Fabrication of a polarizing Fe/Si supermirror bender T. Bigault1, K.H. Andersen1, A. Stunault1, A. Bouvier1, G. Bisig1 1: Institut Laue-Langevin, 6 rue Jules Horowitz, 38042 Grenoble, France; 2: Spallation Neutron Source, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA; 3: Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
10:40-11:00 6.2 A single W:B4C transmission multilayer for polarization analysis of soft xrays up to 1keV Michael A. MacDonald1,2, Franz Schäfers3, Andreas Gaupp3 1: Canadian Light Source Inc., 101 Perimeter Road, Saskatoon, SK S7N 0X4, Canada; 2: STFC Daresbury Laboratory, Warrington WA4 4AD, UK; 3: Helmholtz-Zentrum Berlin HZB-BESSY II, Albert-Einstein-Strasse 15, D-12489 Berlin, Germany
11:00-11:20 6.3 Al-based multilayers for space applications in EUV E. Meltchakov1, F. Auchère1, X. Zhang1, M. Roulliay2, Ch. Bourassin-Bouchet3, A. Jérome3, S. De Rossi3, F. Bridou3, F. Varniere3 and F. Delmotte3 1: Institut d’Astrophysique Spatiale, 91403 Orsay, France; 2: Laboratoire d’Interaction du rayonnement X avec la Matière, 91403 Orsay, France; 3: Laboratoire Charles Fabry, Institut d'Optique Graduate School, 91127 Palaiseau, France
11:20-11:40 6.4 Performance of rare earth based multilayers for the 63 nm solar O V imaging applications Benjawan Kjornrattanawanich,1 David L. Windt,2 and John F.Seely3 1: Universities Space Research Association, National Synchrotron Light Source Beamline X24C, Brookhaven National Laboratory, Upton NY 11973; 2: Reflective X-ray Optics LLC, 1361 Amsterdam Avenue, Suite 3B, New York NY 10027; 3: Space Science Division, Naval Research Laboratory, Washington DC 20375
11:40-12:00 6.5 Thickness control for large area Mo/Si multilayers Jingtao Zhu, Pan Lei, Xiaoqiang Wang, Zhong Zhang, Zhanshan Wang, Institute of Precision Optical Engineering (IPOE), Physics Department, Tongji University, Shanghai 200092, China
12:00-18:30 Free
18:30-20:00 Dinner
20:00-22:00 POSTER SESSION II
P2.1 Nitridated B4C/La multilayer
optics for 6.7nm T. Tsarfati1, I. Makhotkin1, E.
Louis1, R.W.E. van de Kruijs1, F. Bijkerk1,2
1: FOM Institute for Plasma Physics Rijnhuizen, Nieuwegein, The Netherlands; 2:
MESA+ Institute for Nanotechnology, University of Twente, Enschede, The
Netherlands
P2.2 A Cr/Sc Transmission Multilayer as a
dual-band Quarter-Wave Plate for Soft X-Ray Polarimetry Franz Schäfers,
Andreas Gaupp, Michael A. MacDonald1,2 Helmholtz-Zentrum-Berlin
HZB-BESSY II, Albert-Einstein-Strasse 15, D-12489 Berlin 1 STFC Daresbury
Laboratory, Daresbury, Warrington WA4 4AD U.K.; 2: presently at Canadian Light
Source Inc., 101 Perimeter Road, Saskatoon, SK S7N 0X4
P2.3 Supermirrors for 1-10 keV for high resolution
X-ray Imaging plasma diagnostic Ph. Troussel, H. Maury, R. Rosch, C.
Reverdin CEA/DAM Ile de France, Département de Conception et de Réalisation des
Expériences, BP 12, 91680 Bruyères-le-Châtel; France F. Bridou, F. Delmotte, E.
Meltchakov Laboratoire Charles Fabry de l’Institut d’Optique, CNRS, Université
Paris-Sud, Campus Polytechnique, RD128, 91127 Palaiseau cedex
P2.4 Ni/Ti multilayer supermirrors for neutron optics
Zhong Zhang, Pan Lei, Jingtao Zhu, Xiaoqiang Wang, Zhanshan Wang Institute of
Precision Optical Engineering (IPOE), Physics Department, Tongji University,
Shanghai 200092, China
P2.5 Broadband polarization multilayers for 6.7~20 nm
wavelength range Jingtao Zhu, Hongchang Wang, Zhong Zhang, Fengli Wang,
Zhanshan Wang, and Lingyan Chen Institute of Precision Optical Engineering
(IPOE), Physics Department, Tongji University, Shanghai 200092, China
P2.6 Innovative ion beam processing and
coating techniques for X-ray optics P. Gawlitza, St. Braun, A. Leson, IWS
Dresden, Fraunhofer Institute for Material and Beam Technology, Winterbergstr.
28, 01277 Dresden, Germany
P2.7 In-depth and surface characterization of
Al/Mo/SiC multilayers P. Jonnard1, M.-H. Hu1, K. Le
Guen1, J.-M. André1, F. Delmotte2, E.
Meltchakov3, A. Galtayries4 1– Laboratoire Chimie
Physique – Matière Rayonnement, UPMC Univ Paris 06, CNRS, 75005 Paris, France;
2 – Laboratoire Charles Fabry, Institut d'Optique Graduate School, 91127
Palaiseau, France; 3 – Institut d’Astrophysique Spatiale, 91403 Orsay, France;
4 – Laboratoire de Physico-Chimie des Surfaces, Ecole Nationale Supérieure de
Chimie de Paris, 75005 Paris, France
P2.8 Enhanced optical performance of 5.5 sr LPP collector mirror Hagen Pauer, Marco Perske, Sergiy Yulin, Viatcheslav Nesterenko, Mark Schürmann, Sven Schröder, Markus Trost, David Schmitz, Torsten Feigl, Norbert Kaiser Fraunhofer-Institut für Angewandte Optik und Feinmechanik, Albert-Einstein-Str. 7, 07745 Jena, Germany
THURSDAY, FEBRUARY 18
7:00-8:00 Breakfast
8:00-9:50 Oral Session 7: APPLICATIONS III Session Chair: Reiner Dietsch
8:00-8:30 7.1
INVITED Multilayer X-ray
gratigns with high efficiency in the 1-5 keV energy domain
Francois Polack1, Bruno Lagarde1, Mourad
Idir1, Franck Delmotte2, Fadi
Choueikani2, Francoise Bridou2, Marc
Roulliay2, 1: Synchrotron SOLEIL, L'Orme des Merisiers,
Saint-Aubin, BP48, 91191 Gif-sur-Yvette, France, 2: Laboratoire
Charles Fabry de l'Institut d'Optique, CNRS, Université Paris-Sud,
Campus Polytechnique, RD128, 91127 Palaiseau
cedex
8:30-8:50 7.2 New trends on multilayer optics for X-ray
diffractometry in the lab U. Heidorn, S. Kroth, M. Matiaske, F. Hertlein,
J. Wiesmann, C. Michaelsen Incoatec GmbH, Max-Planck-Strasse 2, 21502
Geesthacht, Germany
8:50-9:10 7.3 X-ray KB microscopes with doubleperiodic
multilayers Baozhong Mu, Shengzhen Yi, Jingtao Zhu, Xin Wang, Li
Jiang, Qiushi Huang, Zhanshan Wang Institute of Precision Optical
Engineering (IPOE), Physics Department, Tongji University, Shanghai 200092,
China
9:10-9:30 7.4 Multilayer reflective optics for compact soft X-ray/EUV microscopes I. A. Artyukov1, A. V. Vinogradov1, Ye. A. Bugayev2, O. Yu. Devizenko2, V. V. Kondratenko2, J. J. Rocca 3, C. Menoni 3 1: P. N. Lebedev Physical Institute, 53 Leninsky Prospekt, Moscow, Russia; 2: NTU “Kharkov Polytechnic Institute”, 21 Frunze St., Kharkov, Ukraine; 3: NSF Engineering Research Center for Extreme Ultraviolet Science & Technology and Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, USA
9:30-9:50 7.5 Collector optics for the “water window” Sergiy Yulin, Torsten Feigl, Norbert Kaiser, Fraunhofer-Institut für Angewandte Optik und Feinmechanik, Albert-Einstein 7, D – 07745 Jena, Germany
9:50-10:20 Break
10:20-11:50 Oral Session 8: NANOFOCUSING Session Chair: Eric Ziegler
10:20-10:50 8.1 INVITED
Sub-10nm focusing of hard X-rays by
multilayer mirror optics with an on-site wavefront correction system K.
Yamauchi, Department of Precision Science and Technology, Faculty of Engineering,
Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan; Center of
Ultraprecision Science and Technology, Faculty of Engineering, Osaka University,
2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
10:50-11:10 8.2 Waveoptical Investigations of X-Ray-Mirrors with Special Regard to Figure Errors and Roughness M. Osterhoffa,b, Ch. Moraweb, T. Salditta, S. Kalbfleischa a: Institut für Röntgenphysik, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany b: European Synchrotron Radiation Facility, 6 Rue Jules Horowitz, 38043 Grenoble, France
11:10-11:30 8.3 Development of aspherical X-ray mirrors for
nanofocusing L. Peverini1, I. V. Kozhevnikov2, A.
Rommeveaux1, P. V. Vaerenbergh1, L. Claustre1,
S. Guillet1, J.-Y. Massonnat1, E. Ziegler1, J.
Susini1 1: European Synchrotron Radiation Facility, 38043 Grenoble
cedex, France; 2: Institute of Crystallography, Leninsky prospect 59, Moscow
119333, Russia
11:30-11:50 8.4 The NSLS-II Deposition Laboratory Ray
Conley, Nathalie Bouet, James Biancarosa, Qun Shen, Experimental Facilities
Division, NSLS-II, Brookhaven National Laboratory, Upton, NY 11973
11:50-12:00 Closing Remarks